Publication detail

Spectroscopy of Plasma Deposition Processes Using Dimethylphenylsilane Precursor

PROCHÁZKA, M. KRČMA, F. PŘIKRYL, R.

Original Title

Spectroscopy of Plasma Deposition Processes Using Dimethylphenylsilane Precursor

English Title

Spectroscopy of Plasma Deposition Processes Using Dimethylphenylsilane Precursor

Type

conference paper

Language

en

Original Abstract

The inductively coupled low pressure plasma operating in continuous as well as in pulsed mode was used for the experiments. The aim of the presented experiment was to study the dimethylphenylsilane (DMPS) fragmentation, and the influence of set-up parameters on the deposition process. Fragments of DMPS were identified by optical emission spectroscopy. Dependences of fragment populations on supplied power as well as on DMPS pressure were determined, and consequently, the electron and rotational temperatures were calculated. Some optimal values of set-up parameters as DMPS pressure and duty cycle were found.

English abstract

The inductively coupled low pressure plasma operating in continuous as well as in pulsed mode was used for the experiments. The aim of the presented experiment was to study the dimethylphenylsilane (DMPS) fragmentation, and the influence of set-up parameters on the deposition process. Fragments of DMPS were identified by optical emission spectroscopy. Dependences of fragment populations on supplied power as well as on DMPS pressure were determined, and consequently, the electron and rotational temperatures were calculated. Some optimal values of set-up parameters as DMPS pressure and duty cycle were found.

Keywords

Optical emission spectroscopy, organosilicons, thin film deposition, plasma diagnostics

RIV year

2011

Released

14.01.2011

Location

Bratislava

ISBN

978-80-89186-77-8

Book

Book of Contributed Papers: 18th Symposium on Application of Plasma Processes and Workshop on Plasmas as a Planetary Atmospheres Mimics

Pages from

247

Pages to

251

Pages count

5

BibTex


@inproceedings{BUT36694,
  author="Michal {Procházka} and František {Krčma} and Radek {Přikryl}",
  title="Spectroscopy of Plasma Deposition Processes Using Dimethylphenylsilane Precursor",
  annote="The inductively coupled low pressure plasma operating in continuous as well as in pulsed mode was used for the experiments. The aim of the presented experiment was to study the dimethylphenylsilane (DMPS) fragmentation, and the influence of set-up parameters on the deposition process. Fragments of DMPS were identified by optical emission spectroscopy. Dependences of fragment populations on supplied power as well as on DMPS pressure were determined, and consequently, the electron and rotational temperatures were calculated. Some optimal values of set-up parameters as DMPS pressure and duty cycle were found.",
  booktitle="Book of Contributed Papers: 18th Symposium on Application of Plasma Processes and Workshop on Plasmas as a Planetary Atmospheres Mimics",
  chapter="36694",
  howpublished="electronic, physical medium",
  year="2011",
  month="january",
  pages="247--251",
  type="conference paper"
}