Detail publikace

Spectroscopy of Plasma Deposition Processes Using Dimethylphenylsilane Precursor

Originální název

Spectroscopy of Plasma Deposition Processes Using Dimethylphenylsilane Precursor

Anglický název

Spectroscopy of Plasma Deposition Processes Using Dimethylphenylsilane Precursor

Jazyk

en

Originální abstrakt

The inductively coupled low pressure plasma operating in continuous as well as in pulsed mode was used for the experiments. The aim of the presented experiment was to study the dimethylphenylsilane (DMPS) fragmentation, and the influence of set-up parameters on the deposition process. Fragments of DMPS were identified by optical emission spectroscopy. Dependences of fragment populations on supplied power as well as on DMPS pressure were determined, and consequently, the electron and rotational temperatures were calculated. Some optimal values of set-up parameters as DMPS pressure and duty cycle were found.

Anglický abstrakt

The inductively coupled low pressure plasma operating in continuous as well as in pulsed mode was used for the experiments. The aim of the presented experiment was to study the dimethylphenylsilane (DMPS) fragmentation, and the influence of set-up parameters on the deposition process. Fragments of DMPS were identified by optical emission spectroscopy. Dependences of fragment populations on supplied power as well as on DMPS pressure were determined, and consequently, the electron and rotational temperatures were calculated. Some optimal values of set-up parameters as DMPS pressure and duty cycle were found.

BibTex


@inproceedings{BUT36694,
  author="Michal {Procházka} and František {Krčma} and Radek {Přikryl}",
  title="Spectroscopy of Plasma Deposition Processes Using Dimethylphenylsilane Precursor",
  annote="The inductively coupled low pressure plasma operating in continuous as well as in pulsed mode was used for the experiments. The aim of the presented experiment was to study the dimethylphenylsilane (DMPS) fragmentation, and the influence of set-up parameters on the deposition process. Fragments of DMPS were identified by optical emission spectroscopy. Dependences of fragment populations on supplied power as well as on DMPS pressure were determined, and consequently, the electron and rotational temperatures were calculated. Some optimal values of set-up parameters as DMPS pressure and duty cycle were found.",
  booktitle="Book of Contributed Papers: 18th Symposium on Application of Plasma Processes and Workshop on Plasmas as a Planetary Atmospheres Mimics",
  chapter="36694",
  howpublished="electronic, physical medium",
  year="2011",
  month="january",
  pages="247--251",
  type="conference paper"
}