Publication detail
Plasma Enhanced Chemical Vapour Deposition of SiO2-Like Films: Monitoring and Optimization of the Process
PROCHÁZKA, M. BLAHOVÁ, L. KRČMA, F. PŘIKRYL, R.
Original Title
Plasma Enhanced Chemical Vapour Deposition of SiO2-Like Films: Monitoring and Optimization of the Process
English Title
Plasma Enhanced Chemical Vapour Deposition of SiO2-Like Films: Monitoring and Optimization of the Process
Type
abstract
Language
en
Original Abstract
This work focuses on high density thin films deposited by PECVD using hexamethyldisiloxane precursor. Optical emission spectroscopy was used for plasma diagnostics. Oxygen transmission rate and infrared spectra of deposited layers were measured. Optimal experimental conditions for low carbon content layers and layers with good barrier properties were determined.
English abstract
This work focuses on high density thin films deposited by PECVD using hexamethyldisiloxane precursor. Optical emission spectroscopy was used for plasma diagnostics. Oxygen transmission rate and infrared spectra of deposited layers were measured. Optimal experimental conditions for low carbon content layers and layers with good barrier properties were determined.
Keywords
Thin film deposition, optical emission spectroscopy, oxygen transmission rate
Released
07.12.2012
Publisher
FCH VUT
Location
Brno
ISBN
978-80-214-4545-8
Book
Studentská konference Chemie je život – Sborník abstraktů
Pages from
120
Pages to
120
Pages count
1
BibTex
@misc{BUT101784,
author="Michal {Procházka} and Lucie {Blahová} and František {Krčma} and Radek {Přikryl}",
title="Plasma Enhanced Chemical Vapour Deposition of SiO2-Like Films: Monitoring and Optimization of the Process",
annote="This work focuses on high density thin films deposited by PECVD using hexamethyldisiloxane precursor. Optical emission spectroscopy was used for plasma diagnostics. Oxygen transmission rate and infrared spectra of deposited layers were measured. Optimal experimental conditions for low carbon content layers and layers with good barrier properties were determined.",
address="FCH VUT",
booktitle="Studentská konference Chemie je život – Sborník abstraktů",
chapter="101784",
howpublished="print",
institution="FCH VUT",
year="2012",
month="december",
pages="120--120",
publisher="FCH VUT",
type="abstract"
}