Publication detail

New method for the complete analysis of thin films non-uniform in optical parameters

OHLÍDAL, M., OHLÍDAL, I., FRANTA, D., ČUDEK, V.

Original Title

New method for the complete analysis of thin films non-uniform in optical parameters

Type

abstract

Language

English

Original Abstract

New method enabling us to perform the complete optical analysis of non-absorbing and weakly absorbing thin films non-uniform in thickness and optical constants is presented. This method is based on interpreting the spectral dependences of the reflectance measured for a sufficient number of points forming a matrix in the mean planes of the boundaries of the film analyzed.

Key words in English

Thin films, spectral reflectance

Authors

OHLÍDAL, M., OHLÍDAL, I., FRANTA, D., ČUDEK, V.

Released

1. 10. 2002

Publisher

The University of Tokyo, JApan

Location

Tokyo

Pages from

181

Pages to

181

Pages count

1

BibTex

@misc{BUT60151,
  author="Miloslav {Ohlídal} and Ivan {Ohlídal} and Daniel {Franta} and Vladimír {Čudek}",
  title="New method for the complete analysis of thin films non-uniform in optical parameters",
  booktitle="Asia-Pacific Surface & Interface Analysis Conference",
  year="2002",
  pages="1",
  publisher="The University of Tokyo, JApan",
  address="Tokyo",
  note="abstract"
}