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OHLÍDAL, M., OHLÍDAL, I., FRANTA, D., ČUDEK, V.
Original Title
New method for the complete analysis of thin films non-uniform in optical parameters
Type
abstract
Language
English
Original Abstract
New method enabling us to perform the complete optical analysis of non-absorbing and weakly absorbing thin films non-uniform in thickness and optical constants is presented. This method is based on interpreting the spectral dependences of the reflectance measured for a sufficient number of points forming a matrix in the mean planes of the boundaries of the film analyzed.
Key words in English
Thin films, spectral reflectance
Authors
Released
1. 10. 2002
Publisher
The University of Tokyo, JApan
Location
Tokyo
Pages from
181
Pages to
Pages count
1
BibTex
@misc{BUT60151, author="Miloslav {Ohlídal} and Ivan {Ohlídal} and Daniel {Franta} and Vladimír {Čudek}", title="New method for the complete analysis of thin films non-uniform in optical parameters", booktitle="Asia-Pacific Surface & Interface Analysis Conference", year="2002", pages="1", publisher="The University of Tokyo, JApan", address="Tokyo", note="abstract" }