Publication detail

Reactive magnetron sputtering nitride layer for passivation of crystalline silicon solar cells

Hégr Ondřej, Boušek Jaroslav, Sobota Jaroslav, Bařinka Radim, Poruba Aleš

Original Title

Reactive magnetron sputtering nitride layer for passivation of crystalline silicon solar cells

English Title

Reactive magnetron sputtering nitride layer for passivation of crystalline silicon solar cells

Type

conference paper

Language

en

Original Abstract

Reactive magnetron sputter deposition brings high deposition rate with a possibility to control the layer thickness with comparatively high precision. We deposited the currently used material in the photovoltaic industry - silicon nitride passivation layer. The aim of work was evaluation of both front side and back side surface recombinations and optical properties of sputtered layers and they comparison with passivation layers on standard solar cells made by Solartec company (Czech republic).

English abstract

Reactive magnetron sputter deposition brings high deposition rate with a possibility to control the layer thickness with comparatively high precision. We deposited the currently used material in the photovoltaic industry - silicon nitride passivation layer. The aim of work was evaluation of both front side and back side surface recombinations and optical properties of sputtered layers and they comparison with passivation layers on standard solar cells made by Solartec company (Czech republic).

Keywords

solar cell, passivation layer, magnetron sputtering, silicon nitride

RIV year

2006

Released

08.09.2006

Publisher

WIP-Renewable Energies

ISBN

3-936338-20-5

Book

21st European Photovoltaic Solar Energy Conference

Edition number

1

Pages from

822

Pages to

825

Pages count

4

BibTex


@inproceedings{BUT24574,
  author="Ondřej {Hégr} and Jaroslav {Boušek} and Jaroslav {Sobota} and Radim {Bařinka} and Aleš {Poruba}",
  title="Reactive magnetron sputtering nitride layer for passivation of crystalline silicon solar cells",
  annote="Reactive magnetron sputter deposition brings high deposition rate with a possibility to control the layer thickness with comparatively high precision. We deposited the currently used material in the photovoltaic industry - silicon nitride passivation layer. The aim of work was evaluation of both front side and back side surface recombinations and optical properties of sputtered layers and they comparison with passivation layers on standard solar cells made by Solartec company (Czech republic).",
  address="WIP-Renewable Energies",
  booktitle="21st European Photovoltaic Solar Energy Conference",
  chapter="24574",
  institution="WIP-Renewable Energies",
  number="9",
  year="2006",
  month="september",
  pages="822",
  publisher="WIP-Renewable Energies",
  type="conference paper"
}