Detail publikace

Reactive magnetron sputtering nitride layer for passivation of crystalline silicon solar cells

Hégr Ondřej, Boušek Jaroslav, Sobota Jaroslav, Bařinka Radim, Poruba Aleš

Originální název

Reactive magnetron sputtering nitride layer for passivation of crystalline silicon solar cells

Typ

článek ve sborníku ve WoS nebo Scopus

Jazyk

angličtina

Originální abstrakt

Reactive magnetron sputter deposition brings high deposition rate with a possibility to control the layer thickness with comparatively high precision. We deposited the currently used material in the photovoltaic industry - silicon nitride passivation layer. The aim of work was evaluation of both front side and back side surface recombinations and optical properties of sputtered layers and they comparison with passivation layers on standard solar cells made by Solartec company (Czech republic).

Klíčová slova

solar cell, passivation layer, magnetron sputtering, silicon nitride

Autoři

Hégr Ondřej, Boušek Jaroslav, Sobota Jaroslav, Bařinka Radim, Poruba Aleš

Rok RIV

2006

Vydáno

8. 9. 2006

Nakladatel

WIP-Renewable Energies

ISBN

3-936338-20-5

Kniha

21st European Photovoltaic Solar Energy Conference

Číslo edice

1

Strany od

822

Strany do

825

Strany počet

4

BibTex

@inproceedings{BUT24574,
  author="Ondřej {Hégr} and Jaroslav {Boušek} and Jaroslav {Sobota} and Radim {Bařinka} and Aleš {Poruba}",
  title="Reactive magnetron sputtering nitride layer for passivation of crystalline silicon solar cells",
  booktitle="21st European Photovoltaic Solar Energy Conference",
  year="2006",
  volume="2006",
  number="9",
  pages="4",
  publisher="WIP-Renewable Energies",
  isbn="3-936338-20-5"
}