Publication detail

The fabrication and characterization of half-Heusler YPdBi thin films

POLAT, Ö. ARREGI URIBEETXEBARRIA, J. HORÁK, M. POLČÁK, J. BUKVIŠOVÁ, K. ZLÁMAL, J. ŠIKOLA, T.

Original Title

The fabrication and characterization of half-Heusler YPdBi thin films

Type

journal article in Web of Science

Language

English

Original Abstract

The electrical, optical, and magnetic properties of half-Heusler compounds make them novel interesting materials being studied by many groups worldwide. The synthesis of YPdBi, a member of half-Heusler compounds, thin films have been achieved at different deposition temperatures such as 360 degrees C and 470 degrees C by employing magnetron co-sputtering technique. X-ray diffraction (XRD) examinations have revealed that the film deposited at 360 degrees C has a slightly larger lattice parameter, 6.82 angstrom, than the film fabricated at 470 degrees C, having 6.73 angstrom. The induced strain of the films has been 2.1% and 0.7% for the films deposited at 360 degrees C and 470 degrees C, respectively. Xray photoelectron spectroscopy (XPS) investigations have revealed the obtained films have the stoichiometry close to the 1:1:1 ratio. Scanning electron microscopy (SEM) studies have shown that surface topography varies dramatically as the deposition temperature advances. Furthermore, high-resolution scanning transmission electron microscopy (STEM) has shown that layer-plus-island growth known as the Stranski-Krastanov (SK) growth mode, taking place due to minimization of strain energy, leads to the island formation from a specific film thickness on. It has been shown that while the resistance of the sample grown at 470 degrees C changes abruptly at 2.45 K, which indicates the onset of superconductivity, the sample deposited at 360 degrees C does not show this effect. The absence of the onset of superconductivity in this latter case might be associated with the lattice strain and intensive scattering in this sample.

Keywords

Half-Heusler compounds; Thin films; Magnetron sputtering; STEM; Electrical properties

Authors

POLAT, Ö.; ARREGI URIBEETXEBARRIA, J.; HORÁK, M.; POLČÁK, J.; BUKVIŠOVÁ, K.; ZLÁMAL, J.; ŠIKOLA, T.

Released

1. 2. 2022

Publisher

PERGAMON-ELSEVIER SCIENCE LTD

Location

OXFORD

ISBN

0022-3697

Periodical

JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS

Year of study

161

Number

1

State

United States of America

Pages from

1

Pages to

6

Pages count

6

URL

https://doi.org/10.1016/j.jpcs.2021.110447

BibTex

@article{BUT175591,
  author="Özgür {Polat} and Jon Ander {Arregi Uribeetxebarria} and Michal {Horák} and Josef {Polčák} and Kristýna {Bukvišová} and Jakub {Zlámal} and Tomáš {Šikola}",
  title="The fabrication and characterization of half-Heusler YPdBi thin films",
  journal="JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS",
  year="2022",
  volume="161",
  number="1",
  pages="1--6",
  doi="10.1016/j.jpcs.2021.110447",
  issn="0022-3697",
  url="https://doi.org/10.1016/j.jpcs.2021.110447"
}