Detail publikace

The fabrication and characterization of half-Heusler YPdBi thin films

POLAT, Ö. ARREGI URIBEETXEBARRIA, J. HORÁK, M. POLČÁK, J. BUKVIŠOVÁ, K. ZLÁMAL, J. ŠIKOLA, T.

Originální název

The fabrication and characterization of half-Heusler YPdBi thin films

Typ

článek v časopise ve Web of Science, Jimp

Jazyk

angličtina

Originální abstrakt

The electrical, optical, and magnetic properties of half-Heusler compounds make them novel interesting materials being studied by many groups worldwide. The synthesis of YPdBi, a member of half-Heusler compounds, thin films have been achieved at different deposition temperatures such as 360 degrees C and 470 degrees C by employing magnetron co-sputtering technique. X-ray diffraction (XRD) examinations have revealed that the film deposited at 360 degrees C has a slightly larger lattice parameter, 6.82 angstrom, than the film fabricated at 470 degrees C, having 6.73 angstrom. The induced strain of the films has been 2.1% and 0.7% for the films deposited at 360 degrees C and 470 degrees C, respectively. Xray photoelectron spectroscopy (XPS) investigations have revealed the obtained films have the stoichiometry close to the 1:1:1 ratio. Scanning electron microscopy (SEM) studies have shown that surface topography varies dramatically as the deposition temperature advances. Furthermore, high-resolution scanning transmission electron microscopy (STEM) has shown that layer-plus-island growth known as the Stranski-Krastanov (SK) growth mode, taking place due to minimization of strain energy, leads to the island formation from a specific film thickness on. It has been shown that while the resistance of the sample grown at 470 degrees C changes abruptly at 2.45 K, which indicates the onset of superconductivity, the sample deposited at 360 degrees C does not show this effect. The absence of the onset of superconductivity in this latter case might be associated with the lattice strain and intensive scattering in this sample.

Klíčová slova

Half-Heusler compounds; Thin films; Magnetron sputtering; STEM; Electrical properties

Autoři

POLAT, Ö.; ARREGI URIBEETXEBARRIA, J.; HORÁK, M.; POLČÁK, J.; BUKVIŠOVÁ, K.; ZLÁMAL, J.; ŠIKOLA, T.

Vydáno

1. 2. 2022

Nakladatel

PERGAMON-ELSEVIER SCIENCE LTD

Místo

OXFORD

ISSN

0022-3697

Periodikum

JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS

Ročník

161

Číslo

1

Stát

Spojené státy americké

Strany od

1

Strany do

6

Strany počet

6

URL

https://doi.org/10.1016/j.jpcs.2021.110447

BibTex

@article{BUT175591,
  author="Özgür {Polat} and Jon Ander {Arregi Uribeetxebarria} and Michal {Horák} and Josef {Polčák} and Kristýna {Bukvišová} and Jakub {Zlámal} and Tomáš {Šikola}",
  title="The fabrication and characterization of half-Heusler YPdBi thin films",
  journal="JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS",
  year="2022",
  volume="161",
  number="1",
  pages="1--6",
  doi="10.1016/j.jpcs.2021.110447",
  issn="0022-3697",
  url="https://doi.org/10.1016/j.jpcs.2021.110447"
}