Detail publikace

An Education of 0.1 um CMOS Layout on PC

Originální název

An Education of 0.1 um CMOS Layout on PC

Anglický název

An Education of 0.1 um CMOS Layout on PC

Jazyk

en

Originální abstrakt

The 0.1µm CMOS process technology, in commercial production in 2003, includes copper interconnects, 7 metal layers and five types of MOS devices. In co-operation with ST-microelectronics, the software tool Microwind2 has been configured to support this state-of-the art CMOS process for research and training purpose. This paper describes the recent developments and their application to microelectronics training.

Anglický abstrakt

The 0.1µm CMOS process technology, in commercial production in 2003, includes copper interconnects, 7 metal layers and five types of MOS devices. In co-operation with ST-microelectronics, the software tool Microwind2 has been configured to support this state-of-the art CMOS process for research and training purpose. This paper describes the recent developments and their application to microelectronics training.

BibTex


@inproceedings{BUT9430,
  author="Vladislav {Musil} and Roman {Prokop}",
  title="An Education of 0.1 um CMOS Layout on PC",
  annote="The 0.1µm CMOS process technology, in commercial production in 2003, includes copper interconnects, 7 metal layers and five types of MOS devices. In co-operation with ST-microelectronics, the software tool Microwind2 has been configured to support this state-of-the art CMOS process for research and training purpose. This paper describes the recent developments and their application to microelectronics training.",
  address="Technological Institute of Crete",
  booktitle="Proceedings of the Socrates Workshop 2003. Intensive Training Programme in Electronic System Design.",
  chapter="9430",
  institution="Technological Institute of Crete",
  year="2003",
  month="september",
  pages="39",
  publisher="Technological Institute of Crete",
  type="conference paper"
}