Detail publikace
Pulse mode in plasma polymerization of hexamethyldisiloxane
BLAHOVÁ, L. PROCHÁZKA, M. KRČMA, F.
Originální název
Pulse mode in plasma polymerization of hexamethyldisiloxane
Anglický název
Pulse mode in plasma polymerization of hexamethyldisiloxane
Jazyk
en
Originální abstrakt
PECVD of hexamethyldisiloxane was performed in order to study dependence of the process on duty cycle. Capacitively coupled plasma was measured via optical emission spectroscopy. Experiment shows that dependence of fragment populations on duty cycle was increasing with increasing duty cycle in the case of constant supplied power, however, there was a maximum detected at 30 % in the case of constant mean power. This point might be an optimal setup for the deposition of SiO2 thin films from hexamethyldisiloxane.
Anglický abstrakt
PECVD of hexamethyldisiloxane was performed in order to study dependence of the process on duty cycle. Capacitively coupled plasma was measured via optical emission spectroscopy. Experiment shows that dependence of fragment populations on duty cycle was increasing with increasing duty cycle in the case of constant supplied power, however, there was a maximum detected at 30 % in the case of constant mean power. This point might be an optimal setup for the deposition of SiO2 thin films from hexamethyldisiloxane.
Dokumenty
BibTex
@misc{BUT73653,
author="Lucie {Blahová} and Michal {Procházka} and František {Krčma}",
title="Pulse mode in plasma polymerization of hexamethyldisiloxane",
annote="PECVD of hexamethyldisiloxane was performed in order to study dependence of the process on duty cycle. Capacitively coupled plasma was measured via optical emission spectroscopy. Experiment shows that dependence of fragment populations on duty cycle was increasing with increasing duty cycle in the case of constant supplied power, however, there was a maximum detected at 30 % in the case of constant mean power. This point might be an optimal setup for the deposition of SiO2 thin films from hexamethyldisiloxane.",
booktitle="Chemické Listy 105",
chapter="73653",
year="2011",
month="september",
pages="s901--s902",
type="abstract"
}