Detail publikace

Pulse mode in plasma polymerization of hexamethyldisiloxane

BLAHOVÁ, L. PROCHÁZKA, M. KRČMA, F.

Originální název

Pulse mode in plasma polymerization of hexamethyldisiloxane

Anglický název

Pulse mode in plasma polymerization of hexamethyldisiloxane

Jazyk

en

Originální abstrakt

PECVD of hexamethyldisiloxane was performed in order to study dependence of the process on duty cycle. Capacitively coupled plasma was measured via optical emission spectroscopy. Experiment shows that dependence of fragment populations on duty cycle was increasing with increasing duty cycle in the case of constant supplied power, however, there was a maximum detected at 30 % in the case of constant mean power. This point might be an optimal setup for the deposition of SiO2 thin films from hexamethyldisiloxane.

Anglický abstrakt

PECVD of hexamethyldisiloxane was performed in order to study dependence of the process on duty cycle. Capacitively coupled plasma was measured via optical emission spectroscopy. Experiment shows that dependence of fragment populations on duty cycle was increasing with increasing duty cycle in the case of constant supplied power, however, there was a maximum detected at 30 % in the case of constant mean power. This point might be an optimal setup for the deposition of SiO2 thin films from hexamethyldisiloxane.

Dokumenty

BibTex 


@misc{BUT73653,
  author="Lucie {Blahová} and Michal {Procházka} and František {Krčma}",
  title="Pulse mode in plasma polymerization of hexamethyldisiloxane",
  annote="PECVD of hexamethyldisiloxane was performed in order to study dependence of the process on duty cycle. Capacitively coupled plasma was measured via optical emission spectroscopy. Experiment shows that dependence of fragment populations on duty cycle was increasing with increasing duty cycle in the case of constant supplied power, however, there was a maximum detected at 30 % in the case of constant mean power. This point might be an optimal setup for the deposition of SiO2 thin films from hexamethyldisiloxane.",
  booktitle="Chemické Listy 105",
  chapter="73653",
  year="2011",
  month="september",
  pages="s901--s902",
  type="abstract"
}