Detail publikace

Deposition of Ultrathin Films - Optimalisation of Ion Beam Optics

VOBORNÝ, S., ZLÁMAL, J., BÁBOR, P.

Originální název

Deposition of Ultrathin Films - Optimalisation of Ion Beam Optics

Anglický název

Deposition of Ultrathin Films - Optimalisation of Ion Beam Optics

Jazyk

en

Originální abstrakt

Direct Ion Beam Deposition is an advanced method for processing of thin films. Apparatus for this technique was developed in the Institute of Physical Engineering. The experiments with direct ion beam deposition showed necessity of improving ion optics. In this contribution, some results of ion beam optimization are presented and discussed.

Anglický abstrakt

Direct Ion Beam Deposition is an advanced method for processing of thin films. Apparatus for this technique was developed in the Institute of Physical Engineering. The experiments with direct ion beam deposition showed necessity of improving ion optics. In this contribution, some results of ion beam optimization are presented and discussed.

Dokumenty

BibTex


@inproceedings{BUT3359,
  author="Stanislav {Voborný} and Jakub {Zlámal} and Petr {Bábor}",
  title="Deposition of Ultrathin Films - Optimalisation of Ion Beam Optics",
  annote="Direct Ion Beam Deposition is an advanced method for processing of thin films. Apparatus for this technique was developed in the Institute of Physical Engineering. The experiments with direct ion beam deposition showed necessity of improving ion optics. In this contribution, some results of ion beam optimization are presented and discussed.",
  address="Fakulta strojního inženýrství VUT v Brně",
  booktitle="Juniormat '01 sborník",
  chapter="3359",
  institution="Fakulta strojního inženýrství VUT v Brně",
  year="2001",
  month="september",
  pages="281",
  publisher="Fakulta strojního inženýrství VUT v Brně",
  type="conference paper"
}