Detail publikace

Photo-reflective layer on Low Temperature Co-fired Ceramic for optical applications

Originální název

Photo-reflective layer on Low Temperature Co-fired Ceramic for optical applications

Anglický název

Photo-reflective layer on Low Temperature Co-fired Ceramic for optical applications

Jazyk

en

Originální abstrakt

The article deals with photo-reflective layer on Low-Temperature Co-Fired Ceramic substrate deposition. Measurement of diffusion and specular reflectance and roughness of layer is included. Fabrication process and its optimization is also mentioned. For measurement of deposited layer optical properties, spectrometric method in spherical chamber was used. Further, profile of layers surface was measured by profilometer to acquire dependence between roughness and reflectivity. The main aim of work is to map the possibility of creation of photo-reflective layer on electrical, chemical and thermal resistant substrate in simple way.

Anglický abstrakt

The article deals with photo-reflective layer on Low-Temperature Co-Fired Ceramic substrate deposition. Measurement of diffusion and specular reflectance and roughness of layer is included. Fabrication process and its optimization is also mentioned. For measurement of deposited layer optical properties, spectrometric method in spherical chamber was used. Further, profile of layers surface was measured by profilometer to acquire dependence between roughness and reflectivity. The main aim of work is to map the possibility of creation of photo-reflective layer on electrical, chemical and thermal resistant substrate in simple way.

BibTex


@article{BUT104394,
  author="Martin {Klíma} and Milan {Holík} and Vojtěch {Svatoš} and Jaromír {Hubálek} and Ivan {Szendiuch} and František {Urban}",
  title="Photo-reflective layer on Low Temperature Co-fired Ceramic for optical applications",
  annote="The article deals with photo-reflective layer on Low-Temperature Co-Fired Ceramic substrate deposition. Measurement of diffusion and specular reflectance and roughness of layer is included. Fabrication process and its optimization is also mentioned. For measurement of deposited layer optical properties, spectrometric method in spherical chamber was used. Further, profile of layers surface was measured by profilometer to acquire dependence between roughness and reflectivity. The main aim of work is to map the possibility of creation of photo-reflective layer on electrical, chemical and thermal resistant substrate in simple way.",
  chapter="104394",
  doi="10.4028/www.scientific.net/KEM.592-593.457",
  number="1",
  volume="592-593",
  year="2013",
  month="november",
  pages="457--460",
  type="journal article - other"
}