Course detail

Preparation and properties of thin layers of materials

FCH-DCO_PTVAcad. year: 2023/2024

Terminology; fundamentals of vacuum science; introduction to plasma physics and chemistry; film deposition techniques: vacuum evaporation, sputtering, plasma polymerization, laser-enhanced CVD, CVD processes; thin film characterization: film growth, film thickness and deposition rate, scanning probe microscopy (STM, AFM, EFM, MFM, SNOM), mechanical properties (measurement techniques, internal stress, adhesion).

Language of instruction

Czech

Number of ECTS credits

0

Mode of study

Not applicable.

Guarantor

prof. RNDr. Vladimír Čech, Ph.D.

Department

Institute of Materials Science (ÚCHM)

Entry knowledge

An introduction to thin films.

Rules for evaluation and completion of the course

Entrance written test and oral exam.
Optional attendance at lectures.

Aims

Advanced technologies and analyses of thin films are the aims of this subject.
Students will acquire knowledge of thin films necessary for their dissertation.

Study aids

Not applicable.

Prerequisites and corequisites

Not applicable.

Basic literature

M. Ohring, Materials Science of Thin Films, Academic Press 2002. (CS)
D. Hoffman, B. Singh, J.H. Thomas, Handbook of Vacuum Science and Technology, Academic Press 1998. (CS)
V. L. Mironov, Fundamentals of Scanning Probe Microscopy, NT-MDT 2004. (CS)
H. Bubert, H. Jenett, Surface and Thin Film Analysis, Wiley-VCH, 2002 (CS)

Recommended reading

Not applicable.

Classification of course in study plans

  • Programme DKCP_CHM_4_N Doctoral, 1. year of study, winter semester, compulsory-optional
  • Programme DPCP_CHM_4_N Doctoral, 1. year of study, winter semester, compulsory-optional