FCH-MAO_PLA1Acad. year: 2020/2021
This course is focused on basic properties and processes taking place in plasma, including their diagnostics and possible applications. Students are introduced to plasma thermodynamics and kinetics (non-equilibrium and equilibrium plasma, collision processes, distribution functions, basic transport processes in plasma). Lectures also provide a list of basic methods of plasma diagnostics (spectral, probe, and corpuscular methods). The main part of the course deals with plasma in labs, its properties, particular types of electrical discharges, its generation and possible applications (dc, ac, RF, MW, discharges in liquids, plasma excited at high pressure, capacitive and inductive coupled plasma). A list of plasma chemical processes contains especially reactions in active and post-discharge plasma, surface treatment of various materials, creation of thin layers (PE CVD, PA CVD), plasma polymerization, plasma spraying, sputtering, and etching. Moreover, lasers, plasma displays, eletric arc, electric beam, and plasmas as illumination tools belong to special ideal as well as non-ideal plasma kinds using assisted chemical reactions.
Offered to foreign students
Of all faculties
Learning outcomes of the course unit
Passing the course provides students knowledge of plasma fundamental, principles of plasma generation and its diagnostics and present technology of plasma chemistry.
Physical chemistry - thermodynamics, kinetics.
Physics - mass point motion, electric field and current, magnetic field
Mathematics - differential equations
Recommended optional programme components
Recommended or required reading
Chen F., Chang J. P.: Principles of Plasma Processing. Kluwer Academic, Plenum Publishers, NewYork 2003. (EN)
Roth J. R.: Industrial Plasma Engineering Volume 2: Applications to Nonthermal Plasma Processing. Institute of Physics Publishing, Bristol and Philadelphia 2001. (EN)
Roth J. R.: Industrial Plasma Engineering Volume 1: Principles. Institute of Physics Publishing, Bristol and Philadelphia 1995. (EN)
Ricard A.: Reactive Plasmas. Société Francaise du Vide, Paris 1996 (EN)
Bruggeman P. J. et al.: Plasma–liquid interactions: a review and roadmap, Plasma Sources Sci. Technol. 25 (2016) 053002 (59pp) (EN)
Samukawa S. et al.: The 2012 Plasma Roadmap, J. Phys. D: Appl. Phys. 45 (2012) 253001 (37pp) (EN)
Planned learning activities and teaching methods
The course uses teaching methods in form of Lecture - 2 teaching hours per week. The e-learning system (LMS Moodle) is available to teachers and students.
Assesment methods and criteria linked to learning outcomes
Written examination. It consists of ten questions scored by points; maximal point achievement is 100, limit to pass is 50 points.
Language of instruction
1. Plasma definition, ideal plasma conditions, types of plasma
2. Basic collision processes, cross section, collision frequency
3. Plasma kinetic theory, Boltzmann kinetic equation, velocity distribution functions
4. Physical plasma properties
5. Laboratory plasma breakdown conditions in gases, Townsend´s theory of electron avalanches, Paschen´s law
6. Laboratory plasma: electric discharges in gases and liquids
7. Plasma diagnostics: spectral and optical methods
8. Plasma diagnostics: probe and corpuscular methods
9. Introduction to plasma chemistry, conditions for realization of plasma-chemical reactions, reactions in non-equilibrium chemical kinetics, kinetics of plasma-chemical reactions
10. Plasma polymerisation, surface treatment of synthetic and natural materials
11. Selected plasma-chemical technologies: plasma etching, sputtering and spraying, thin film deposition (PE CVD, PA CVD)
12. Special kinds of plasma with participation of chemical reactions: illumination techniques, plasma displays, chemical lasers
13. Electric arc, electron beam processing
The course of Plasma Chemistry is focused on fundamental properties of plasma state and present methodology of plasma chemistry in order to let students apply the unique physical characteristics of plasma to the fields such as material science, microelectronics, biology, and polymer, organic, inorganic and analytical chemistry.
Specification of controlled education, way of implementation and compensation for absences