Course detail
Preparation and properties of thin layers of materials
FCH-DCO_PTVAcad. year: 2020/2021
Terminology; fundamentals of vacuum science; introduction to plasma physics and chemistry; film deposition techniques: vacuum evaporation, sputtering, plasma polymerization, laser-enhanced CVD, CVD processes; thin film characterization: film growth, film thickness and deposition rate, scanning probe microscopy (STM, AFM, EFM, MFM, SNOM), mechanical properties (measurement techniques, internal stress, adhesion).
Supervisor
Department
Learning outcomes of the course unit
Students will acquire knowledge of thin films necessary for their dissertation.
Prerequisites
An introduction to thin films.
Co-requisites
Not applicable.
Recommended optional programme components
Not applicable.
Recommended or required reading
M. Ohring, Materials Science of Thin Films, Academic Press 2002. (CS)
D. Hoffman, B. Singh, J.H. Thomas, Handbook of Vacuum Science and Technology, Academic Press 1998. (CS)
V. L. Mironov, Fundamentals of Scanning Probe Microscopy, NT-MDT 2004. (CS)
H. Bubert, H. Jenett, Surface and Thin Film Analysis, Wiley-VCH, 2002 (CS)
Planned learning activities and teaching methods
The course uses teaching methods in form of individual consultation. The e-learning system (LMS Moodle) is available to teachers and students.
Assesment methods and criteria linked to learning outcomes
Entrance written test and oral exam.
Language of instruction
Czech
Work placements
Not applicable.
Course curriculum
Terminology; fundamentals of vacuum science; introduction to plasma physics and chemistry; film deposition techniques: vacuum evaporation, sputtering, plasma polymerization, laser-enhanced CVD, CVD processes; thin film characterization: film growth, film thickness and deposition rate, scanning probe microscopy (STM, AFM, EFM, MFM, SNOM), mechanical properties (measurement techniques, internal stress, adhesion).
Introduction / information sources
Fundamentals of vacuum science
Introduction to plasma physics and chemistry
Physical vapor deposition
Chemical vapor deposition
Plasma-enhanced chemical vapor deposition
Film growth
Film thickness
Scanning probe microscopy
Mechanical properties
Case study
Aims
Advanced technologies and analyses of thin films are the aims of this subject.
Specification of controlled education, way of implementation and compensation for absences
Optional attendance at lectures.
Classification of course in study plans
- Programme DKAP_CHM_4 Doctoral
branch DKAO_CHM_4 , 1. year of study, winter semester, 0 credits, compulsory-optional
- Programme DKCP_CHM_4 Doctoral
branch DKCO_CHM_4 , 1. year of study, winter semester, 0 credits, compulsory-optional
- Programme DPAP_CHM_4 Doctoral
branch DPAO_CHM_4 , 1. year of study, winter semester, 0 credits, compulsory-optional
- Programme DPCP_CHM_4 Doctoral
branch DPCO_CHM_4 , 1. year of study, winter semester, 0 credits, compulsory-optional
- Programme DPCP_CHM_4_N Doctoral, 1. year of study, winter semester, 0 credits, compulsory-optional
- Programme DKCP_CHM_4_N Doctoral, 1. year of study, winter semester, 0 credits, compulsory-optional
eLearning
eLearning: currently opened course