Course detail

Thin Films

FCH-MCO_TVRAcad. year: 2020/2021

Terminology; fundamentals of vacuum science; introduction to plasma physics and chemistry; film deposition techniques: vacuum evaporation, sputtering, plasma polymerization, laser-enhanced CVD, CVD processes; thin film characterization: film growth, film thickness and deposition rate, scanning probe microscopy (STM, AFM, EFM, MFM, SNOM), mechanical properties (measurement techniques, internal stress, adhesion).

Learning outcomes of the course unit

Students acquire basic knowledge about thin-film technology, characterization and application. They can use this knowledge in their diploma thesis and later as technologists and researchers.

Prerequisites

Basic chemistry and physics.

Co-requisites

Not applicable.

Recommended optional programme components

Not applicable.

Recommended or required reading

Ohring M.: Materials Science of Thin Films. Academic Press, San Diego 2002. (CS)
M. Ohring, The Materials Science of Thin Films, Academic Press 2001 (CS)
Hoffman D., Singh B., Thomas J. H.: Handbook of Vacuum Science and Technology. Academic Press, San Diego 1998. (CS)
D.M. Hoffman, B. Singh, J.H. Thomas, Handbook of Vacuum Science and Technology, Academic Press 1998 (CS)
Mironov V. L.: Fundamentals of Scanning Probe Microscopy. Tekhnosfera, Moscow 2004. (CS)
N. Inagaki, Plasma Surface Modification and Plasma Polymerization, Technomic 1996 (CS)
Eckertová L.: Fyzika tenkých vrstev. SNTL, Praha 1973. (CS)

Planned learning activities and teaching methods

The course uses teaching methods in form of Lecture - 2 teaching hours per week. The e-learning system (LMS Moodle) is available to teachers and students.

Assesment methods and criteria linked to learning outcomes

Entrance written test and oral exam are aimed at basic knowledge about thin film technologies and thin film characterization.

Language of instruction

Czech

Work placements

Not applicable.

Course curriculum

1. Introduction / information sources
2. Fundamentals of vacuum science
3. Introduction to plasma physics and chemistry
4. Physical vapor deposition
5. Chemical vapor deposition
6. Plasma-enhanced chemical vapor deposition
7. Film growth
8. Film thickness measurement
9. Scanning probe microscopy
10. Mechanical properties
11. Case study
12. Case study
13. Written test, visit to laboratories

Aims

Knowledge about advanced technologies and analyses of thin films is the aims of this subject.

Specification of controlled education, way of implementation and compensation for absences

Participation at lectures is not mandatory.

Classification of course in study plans

  • Programme NKCP_CHM Master's

    branch NKCO_CHM , 2. year of study, winter semester, 4 credits, compulsory-optional

  • Programme NPCP_CHM Master's

    branch NPCO_CHM , 2. year of study, winter semester, 4 credits, compulsory-optional

  • Programme CKCP_CZV lifelong learning

    branch CKCO_CZV , 1. year of study, winter semester, 4 credits, compulsory-optional

Type of course unit

 

Lecture

26 hours, optionally

Teacher / Lecturer

Guided consultation in combined form of studies

26 hours, obligation not entered

Teacher / Lecturer

eLearning