Course detail

Preparation and properties of thin layers of materials

FCH-DCO_PTVAcad. year: 2019/2020

Terminology; fundamentals of vacuum science; introduction to plasma physics and chemistry; film deposition techniques: vacuum evaporation, sputtering, plasma polymerization, mass spektrometry, laser-enhanced CVD, CVD processes; thin film characterization: film growth, film thickness and deposition rate, scanning probe microscopy (STM, AFM, EFM, MFM, SNOM), mechanical properties (measurement techniques, internal stress, adhesion), spectroscopic ellipsometry and analytical methods (XPS, RBS, ERDA, FTIR).

Learning outcomes of the course unit

Students will acquire knowledge of thin films necessary for their dissertation.

Prerequisites

Fundamentals of physics and chemistry.

Co-requisites

Not applicable.

Recommended optional programme components

Not applicable.

Recommended or required reading

M. Ohring, Materials Science of Thin Films, Academic Press 2002. (CS)
D. Hoffman, B. Singh, J.H. Thomas, Handbook of Vacuum Science and Technology, Academic Press 1998. (CS)
V. L. Mironov, Fundamentals of Scanning Probe Microscopy, NT-MDT 2004. (CS)
H. Bubert, H. Jenett, Surface and Thin Film Analysis, Wiley-VCH, 2002 (CS)

Planned learning activities and teaching methods

The course uses teaching methods in form of individual consultation. The e-learning system (LMS Moodle) is available to teachers and students.

Assesment methods and criteria linked to learning outcomes

Written test and oral exam.

Language of instruction

Czech

Work placements

Not applicable.

Course curriculum

Terminology; fundamentals of vacuum science; introduction to plasma physics and chemistry; film deposition techniques: vacuum evaporation, sputtering, plasma polymerization, mass spektrometry, laser-enhanced CVD, CVD processes; thin film characterization: film growth, film thickness and deposition rate, scanning probe microscopy (STM, AFM, EFM, MFM, SNOM), mechanical properties (measurement techniques, internal stress, adhesion), spectroscopic ellipsometry and analytical methods (XPS, RBS, ERDA, FTIR).

Introduction / information sources
Fundamentals of vacuum science
Introduction to plasma physics and chemistry
Physical vapor deposition
Chemical vapor deposition
Plasma-enhanced chemical vapor deposition
Mass spectrometry
Film growth
Film thickness
Scanning probe microscopy
Mechanical properties
Spectroscopic ellipsometry
X-ray photoelectron spectroscopy (XPS)
Rutherford Backscattering Spectrometry (RBS):
Elastic Recoil Detection Analysis (ERDA):
Fourier Transform Infrared Spectroscopy (FTIR):
Case study

Aims

Advanced technologies and analyses of thin films are the aims of this subject.

Specification of controlled education, way of implementation and compensation for absences

Optional attendance at lectures.

Classification of course in study plans

  • Programme DPAP_CHM_4 Doctoral

    branch DPAO_CHM_4 , 1. year of study, winter semester, 0 credits, compulsory-optional

  • Programme DKAP_CHM_4 Doctoral

    branch DKAO_CHM_4 , 1. year of study, winter semester, 0 credits, compulsory-optional

  • Programme DPCP_CHM_4 Doctoral

    branch DPCO_CHM_4 , 1. year of study, winter semester, 0 credits, compulsory-optional

  • Programme DKCP_CHM_4 Doctoral

    branch DKCO_CHM_4 , 1. year of study, winter semester, 0 credits, compulsory-optional

  • Programme AKREDITACE Doctoral, 1. year of study, winter semester, 0 credits, compulsory-optional

Type of course unit

 

Lecture

26 hours, optionally

Teacher / Lecturer

eLearning