Czech

Not applicable.

Students will acquire knowledge of thin films necessary for their dissertation.

Fundamentals of physics and chemistry.

Not applicable.

The course uses teaching methods in form of individual consultation. The e-learning system (LMS Moodle) is available to teachers and students.

Written test and oral exam.

Terminology; fundamentals of vacuum science; introduction to plasma physics and chemistry; film deposition techniques: vacuum evaporation, sputtering, plasma polymerization, mass spektrometry, laser-enhanced CVD, CVD processes; thin film characterization: film growth, film thickness and deposition rate, scanning probe microscopy (STM, AFM, EFM, MFM, SNOM), mechanical properties (measurement techniques, internal stress, adhesion), spectroscopic ellipsometry and analytical methods (XPS, RBS, ERDA, FTIR).

Introduction / information sources
Fundamentals of vacuum science
Introduction to plasma physics and chemistry
Physical vapor deposition
Chemical vapor deposition
Plasma-enhanced chemical vapor deposition
Mass spectrometry
Film growth
Film thickness
Scanning probe microscopy
Mechanical properties
Spectroscopic ellipsometry
X-ray photoelectron spectroscopy (XPS)
Rutherford Backscattering Spectrometry (RBS):
Elastic Recoil Detection Analysis (ERDA):
Fourier Transform Infrared Spectroscopy (FTIR):
Case study

Not applicable.

Advanced technologies and analyses of thin films are the aims of this subject.

Optional attendance at lectures.

Not applicable.

Not applicable.

M. Ohring, Materials Science of Thin Films, Academic Press 2002. (CS)
D. Hoffman, B. Singh, J.H. Thomas, Handbook of Vacuum Science and Technology, Academic Press 1998. (CS)
V. L. Mironov, Fundamentals of Scanning Probe Microscopy, NT-MDT 2004. (CS)
H. Bubert, H. Jenett, Surface and Thin Film Analysis, Wiley-VCH, 2002 (CS)

Not applicable.

26 hours, optionally