Publication detail

Plasma polymer films of controlled physical and chemical properties

ČECH, V.

Original Title

Plasma polymer films of controlled physical and chemical properties

Type

lecture

Language

English

Original Abstract

Plasma polymer films were deposited from organosilicon monomers (hexamethyldisiloxane, vinyltriethoxysilane, and tetra-vinylsilane (pure or in a mixture with oxygen gas) by pulsed plasma at different power (0.05–40 W). The deposited materials in the form of hydrogenated amorphous carbon-silicon oxide (a-SiOC:H) alloy are discussed with respect to their chemical, optical, mechanical, and surface properties controlled by pulsed plasma.

Keywords

thin films, PECVD

Authors

ČECH, V.

Released

31. 7. 2012

Location

National Taiwan University of Science and Technology, Taipei, Taiwan

BibTex

@misc{BUT97299,
  author="Vladimír {Čech}",
  title="Plasma polymer films of controlled physical and chemical properties",
  year="2012",
  address="National Taiwan University of Science and Technology, Taipei, Taiwan",
  note="lecture"
}