Publication detail

Spectroscopic monitoring of low pressure plasma deposition of Silane and Siloxane based thin films

RAŠKOVÁ, Z., ŠORMOVÁ, H., HAVELKOVÁ, I., KRČMA, F., VANĚK, J., PŘIKRYL, R., ČECH, V.

Original Title

Spectroscopic monitoring of low pressure plasma deposition of Silane and Siloxane based thin films

English Title

Spectroscopic monitoring of low pressure plasma deposition of Silane and Siloxane based thin films

Type

conference paper

Language

en

Original Abstract

The main part of this work is focused on the identification of the spectra measured during the plasma deposition using the vinyltriethoxysilane in a continual regime and also in a pulsed regime with the varied relative pulse duration and during deposition with an amount of oxygen added in various ratios. The next part is focused on spectroscopic observation during the plasma deposition using the hexamethyldisiloxane and gamma-metacryloxyprophyltrimethoxysilane.

English abstract

The main part of this work is focused on the identification of the spectra measured during the plasma deposition using the vinyltriethoxysilane in a continual regime and also in a pulsed regime with the varied relative pulse duration and during deposition with an amount of oxygen added in various ratios. The next part is focused on spectroscopic observation during the plasma deposition using the hexamethyldisiloxane and gamma-metacryloxyprophyltrimethoxysilane.

Keywords

Plasma deposition, optical emission spectroscopy, organosilicones

RIV year

2003

Released

15.11.2003

Publisher

MATFYZPRESS

Location

Praha

ISBN

80-86732-18-5

Book

Proceedings of the 12th Annual Conference of Doctoral Students - WDS 2003

Edition number

1

Pages from

441

Pages to

445

Pages count

5

BibTex


@inproceedings{BUT8852,
  author="Zuzana {Rašková} and Hana {Šormová} and Iveta {Havelková} and František {Krčma} and Jan {Vaněk} and Radek {Přikryl} and Vladimír {Čech}",
  title="Spectroscopic monitoring of low pressure plasma deposition of Silane and Siloxane based thin films",
  annote="The main part of this work is focused on the identification of the spectra measured during the plasma deposition using the vinyltriethoxysilane in a continual regime and also in a pulsed regime with the varied relative pulse duration and during deposition with an amount of oxygen added in various ratios.  The next part is focused on spectroscopic observation during the plasma deposition using the hexamethyldisiloxane and gamma-metacryloxyprophyltrimethoxysilane.",
  address="MATFYZPRESS",
  booktitle="Proceedings of the 12th Annual Conference of Doctoral Students - WDS 2003",
  chapter="8852",
  institution="MATFYZPRESS",
  year="2003",
  month="november",
  pages="441",
  publisher="MATFYZPRESS",
  type="conference paper"
}