Publication detail

Spectroscopic Observation of Plasma Deposition of Thin Silane and Siloxane Based Films

RAŠKOVÁ, Z., ŠORMOVÁ, H., HAVELKOVÁ, I., KRČMA, F., VANĚK, J., PŘIKRYL, R., ČECH, V.

Original Title

Spectroscopic Observation of Plasma Deposition of Thin Silane and Siloxane Based Films

English Title

Spectroscopic Observation of Plasma Deposition of Thin Silane and Siloxane Based Films

Type

conference paper

Language

en

Original Abstract

The spectroscopic studies have been focused on the basic characterization of the RF discharge conditions during the films deposition. In the discharge spectra many different species has been determined. To characterize the neutral gas temperature the small amount of nitrogen has been involved into the discharge. The dependencies of the temperature and the molecular excitations in the discharge have been initially studied on the total discharge power and gas composition. The correlation among the discharge parameters and the final layer properties will be subject of the following studies.

English abstract

The spectroscopic studies have been focused on the basic characterization of the RF discharge conditions during the films deposition. In the discharge spectra many different species has been determined. To characterize the neutral gas temperature the small amount of nitrogen has been involved into the discharge. The dependencies of the temperature and the molecular excitations in the discharge have been initially studied on the total discharge power and gas composition. The correlation among the discharge parameters and the final layer properties will be subject of the following studies.

Keywords

Low temperature plasma deposition, Optical emission spectroscopy

RIV year

2003

Released

01.04.2003

Publisher

Universita Bari

Location

Bari

Pages from

214

Pages to

217

Pages count

4

BibTex


@inproceedings{BUT8827,
  author="Zuzana {Rašková} and Hana {Šormová} and Iveta {Havelková} and František {Krčma} and Jan {Vaněk} and Radek {Přikryl} and Vladimír {Čech}",
  title="Spectroscopic Observation of Plasma Deposition of Thin Silane and Siloxane Based Films",
  annote="The spectroscopic studies have been focused on the basic characterization of the RF discharge conditions during the films deposition. In the discharge spectra many different species has been determined. To characterize the neutral gas temperature the small amount of nitrogen has been involved into the discharge. The dependencies of the temperature and the molecular excitations in the discharge have been initially studied on the total discharge power and gas composition. The correlation among the discharge parameters and the final layer properties will be subject of the following studies.",
  address="Universita Bari",
  booktitle="Proceedings of Frontiers in Low Temperature Plasma Diagnostics V",
  chapter="8827",
  institution="Universita Bari",
  year="2003",
  month="april",
  pages="214",
  publisher="Universita Bari",
  type="conference paper"
}