Publication detail

Protective layers on Ni-based superalloys formed by co-deposition of Al and Si

POSPÍŠILOVÁ, S. KREJČÍ, J. PODRÁBSKÝ, T. ČELKO, L.

Original Title

Protective layers on Ni-based superalloys formed by co-deposition of Al and Si

Type

abstract

Language

English

Original Abstract

Co-deposition of Al and Si on nickel-based superalloys (Inconel 713LC and Inconel 738LC) is being studied by means of light and scanning electron microscope equipped for EDS microanalysis. After "painting" the substrate with colloidal fluid containing Al and Si particles, diffusion annealing follows (the method was developed in former Soviet Union for military aircraft engines). Surface layer affected by diffusion of Al and Si splits into two sub-layers, Al rich and Si rich. Final structure is formed (from surface to the substrate) by oxide film (Al2O3 + Cr2O3), Al rich region, Si rich region and substrate deficient in Al and therefore free of Ni3Al particles. To obtain composition of surface proper and details in immediately adjacent material, EDS analysis using decreasing acceleration voltage (AV) in SEM, was employed. This measurements made it possible to, through extrapolation of measured curves to 0 kV AV, obtain composition of surface film (oxides) and composition changes in material closest to the surface.

Keywords

Al-Si layers, Inconel, EDS

Authors

POSPÍŠILOVÁ, S.; KREJČÍ, J.; PODRÁBSKÝ, T.; ČELKO, L.

RIV year

2006

Released

1. 6. 2006

Publisher

RMS Royal Microscopical Society

Location

RMS Royal Microscopical Society, 37/38 St.Clements, Oxford OX4 IAJ, UK

Pages from

47

Pages to

47

Pages count

1

BibTex

@misc{BUT61018,
  author="Simona {Hutařová} and Jan {Krejčí} and Tomáš {Podrábský} and Ladislav {Čelko}",
  title="Protective layers on Ni-based superalloys formed by co-deposition of Al and Si",
  booktitle="Microscience 2006",
  year="2006",
  series="2006",
  edition="1",
  pages="47--47",
  publisher="RMS Royal Microscopical Society",
  address="RMS Royal Microscopical Society, 37/38 St.Clements, Oxford OX4 IAJ, UK",
  note="abstract"
}