Publication detail

Novel plasma reactor with bottom rotary electrode for Plasma-enhanced chemical vapor deposition of nanostructured films

PŘIKRYL, R. ČECH, V. HEDBAVNY, P. INAGAKI, N.

Original Title

Novel plasma reactor with bottom rotary electrode for Plasma-enhanced chemical vapor deposition of nanostructured films

Type

abstract

Language

English

Original Abstract

The aim of article is description of newly designed system for nanotechnology realised via PE-CVD technique

Keywords

PECVD, NANO, technology

Authors

PŘIKRYL, R.; ČECH, V.; HEDBAVNY, P.; INAGAKI, N.

Released

12. 8. 2005

Publisher

Centre for Advanced coatings Technology, University of Toronto

Location

Toronto

Pages from

423

Pages to

424

Pages count

2

BibTex

@misc{BUT60241,
  author="Radek {Přikryl} and Vladimír {Čech} and Pavel {Hedbavny} and Norihiro {Inagaki}",
  title="Novel plasma reactor with bottom rotary electrode for Plasma-enhanced chemical vapor deposition of nanostructured films",
  booktitle="Proceedings of 17th symposium on plasma chemistry",
  year="2005",
  pages="423--424",
  publisher="Centre for Advanced coatings Technology, University of Toronto",
  address="Toronto",
  note="abstract"
}