Publication detail

EXAMINATION OF NANOSTRUCTURES BY ELECTRON BEAM

HRNČIŘÍK, P., MULLEROVÁ, I.

Original Title

EXAMINATION OF NANOSTRUCTURES BY ELECTRON BEAM

Type

abstract

Language

English

Original Abstract

The scanning electron microscope (SEM) equipped with the cathode lens enables one to image the specimen within full scale of electron energies with nearly unchanged image resolution. In the very low energy range (units to hundreds of eV), not available in classical SEM (units to tens of keV), new contrasts appear that reflect local chemical, crystallinic and electronic properties of the specimen. Interpretation of the image is hence often ambiguous. Important alternative is combination with a complementary technique, particularly with the scanning Auger electron microscopy revealing the elemental composition within the information depth similar to that of the low energy SEM. In the frame of this project an ultrahigh vacuum (UHV) apparatus with the field-emission electron gun is being completed with both methods implemented at the image resolution in the nm range. The elaborated method will be applied to examination of selected semiconductor structures, multilayers and composites based on metal alloys.

Key words in English

nanostructures, ultrahigh vacuum, SEM

Authors

HRNČIŘÍK, P., MULLEROVÁ, I.

Released

1. 1. 2004

Publisher

Department for Nanostructured Materials, Jožef Stefan Institute

Location

Slovinsko

Pages from

139

Pages to

139

Pages count

1

BibTex

@misc{BUT59948,
  author="Petr {Hrnčiřík} and Ilona {Müllerová}",
  title="EXAMINATION OF NANOSTRUCTURES BY ELECTRON BEAM",
  booktitle="Electron Probe Microanalysis Today",
  year="2004",
  pages="1",
  publisher="Department for Nanostructured Materials, Jožef Stefan Institute",
  address="Slovinsko",
  note="abstract"
}