Publication detail

Plasma Diagnostic During Deposition Processes of Silane Based Thin Films

Rašková, Z., Brandejs, K., Krčma, F., Vaněk, J.

Original Title

Plasma Diagnostic During Deposition Processes of Silane Based Thin Films

English Title

Plasma Diagnostic During Deposition Processes of Silane Based Thin Films

Type

journal article - other

Language

en

Original Abstract

Our work deals with the identification of the intensive spectral lines and bands measured during the plasma deposition using the hexamethyldisiloxane (HMDSO) and the tetravinylsilane (TVS) as monomer. The deposition processes were carried out in a continual regime as well as in a pulsed regime with the varied relative pulse duration. At first, the pure monomers were used. Furthermore, tetravinylsilane was mixed in various ratios with oxygen, the CH4 + H2 gas mixture was added to hexamethyldisiloxane. We observed a lot of changes in intensity and character of spectra with increasing pulse duration, with increasing oxygen flow rate. Oxygen has an important role for the creation of various fragments and cyclic oligomers. In the next part of experiment, exhaust gas was investigated by gas-chromatography and mass spectrometry (GC-MS). Oligomers with complex structure were identified.

English abstract

Our work deals with the identification of the intensive spectral lines and bands measured during the plasma deposition using the hexamethyldisiloxane (HMDSO) and the tetravinylsilane (TVS) as monomer. The deposition processes were carried out in a continual regime as well as in a pulsed regime with the varied relative pulse duration. At first, the pure monomers were used. Furthermore, tetravinylsilane was mixed in various ratios with oxygen, the CH4 + H2 gas mixture was added to hexamethyldisiloxane. We observed a lot of changes in intensity and character of spectra with increasing pulse duration, with increasing oxygen flow rate. Oxygen has an important role for the creation of various fragments and cyclic oligomers. In the next part of experiment, exhaust gas was investigated by gas-chromatography and mass spectrometry (GC-MS). Oligomers with complex structure were identified.

Keywords

optical spectrum, tetravinylsilane, effective power

RIV year

2004

Released

10.06.2004

Publisher

AV ČR

Location

Praha

Pages from

1036

Pages to

1041

Pages count

6

BibTex


@article{BUT46187,
  author="Zuzana {Rašková} and Kamil {Brandejs} and František {Krčma} and Jan {Vaněk}",
  title="Plasma Diagnostic During Deposition Processes of Silane Based Thin Films",
  annote="Our work deals with the identification of the intensive spectral lines and bands
measured during the plasma deposition using the hexamethyldisiloxane (HMDSO) and the tetravinylsilane (TVS) as monomer. The deposition processes were carried out in a continual regime as well as in a pulsed regime with the varied relative pulse duration. At first, the pure monomers were used. Furthermore, tetravinylsilane was mixed in various ratios with oxygen,  the CH4 + H2 gas mixture was added to hexamethyldisiloxane. We observed a lot of changes in intensity and character of spectra with increasing pulse duration, with increasing oxygen flow rate. Oxygen has an important role for the creation of various fragments and cyclic oligomers. In the next part of experiment, exhaust gas was investigated by gas-chromatography and 
mass spectrometry (GC-MS). Oligomers with complex structure were identified.",
  address="AV ČR",
  chapter="46187",
  edition="NEuvedeno",
  institution="AV ČR",
  journal="Czechoslovak Journal of Physics",
  number="C",
  volume="54",
  year="2004",
  month="june",
  pages="1036",
  publisher="AV ČR",
  type="journal article - other"
}