Post-deposition oxidation of plasma-polymerized tetravinylsilane films

conference paper

English

Plasma Enhanced Chemical Vapour Deposition (PECVD) was employed to prepare series of plasma-polymerized thin films from tetravinylsilane (TVS, Si-(CH=CH2)4) monomer and a mixture of TVS and oxygen gas. The O2/(TVS+O2) flow-rate ratio was set at 0.00, 0.40 and 0.79. The effective power (Peff) of pulsed plasma was changed by prolonging the toff (time when plasma is switched off) if ton (time when plasma is switched on) = 1 ms was constant and Ptotal = 50 W. Peff was changed from 0.1 W to 10 W. The set of samples was analyzed by Fourier Transformed Infrared Spectroscopy (FTIR) to investigate chemical structure and phase-modulated spectroscopic ellipsometry was used to determine film thickness and optical constants, i.e. refractive index and extinction coefficient. Post-deposition oxidation of plasma polymer films exposed to air was investigated in the study. FTIR and ellipsometry measurements were carried out at 10 min, 1 hour, 7 hours, 1 day, 4 days, 14 days and 1 month after the film deposition. The diffusion of oxygen into films was observed through the development of absorption bands corresponding to vibrations of oxygen containing species in FTIR spectra (3650 - 3200 cm-1 - O-H stretching, 1714 cm-1 - C=O stretching and 1100 - 1000 cm-1 - Si-O-C stretching). The post-deposition oxidation of films resulted in a descent of the refractive index and a shift of the UV absorption band towards shorter wavelengths.

plasma polymerization, thin film, FTIR, ellipsometry

STUDÝNKA, J.; ČECH, V.; ČECHALOVÁ, B.

2007

13. 12. 2007

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