Publication detail

Near-field optical measurement and sensing in Nanophotonics

TOMÁNEK, P. GRMELA, L.

Original Title

Near-field optical measurement and sensing in Nanophotonics

Czech Title

Využití metod optického blízkého pole pro měření a senzory v nanofotonice

English Title

Near-field optical measurement and sensing in Nanophotonics

Type

conference paper

Language

en

Original Abstract

The current progress in semiconductor optoelectronics, laser diodes, fast photodetectors, optical modulators, MEMS and MOEMS technology, micro- and nano-electronics development and optical manufacturing technology opens new and improved perspectives for optical sensors and measuring systems, which integrate several components in order to achieve new functionalities. To measure local characteristics of these devices, the use of near-field optics is very important because the coupling of the evanescent electromagnetic field and the radiative electromagnetic waves in the vicinity of a nano-probe placed near the boundary between allows overcome the diffraction limit of light of conventional optics. This technique could be useful to the measurement and sensing of local optical and electro-optical characteristics in nanoscience. The paper brings an overview of several methods using the contrast mechanisms in optical near-field to characterize nanophotonic devices.

Czech abstract

The current progress in semiconductor optoelectronics, laser diodes, fast photodetectors, optical modulators, MEMS and MOEMS technology, micro- and nano-electronics development and optical manufacturing technology opens new and improved perspectives for optical sensors and measuring systems, which integrate several components in order to achieve new functionalities. To measure local characteristics of these devices, the use of near-field optics is very important because the coupling of the evanescent electromagnetic field and the radiative electromagnetic waves in the vicinity of a nano-probe placed near the boundary between allows overcome the diffraction limit of light of conventional optics. This technique could be useful to the measurement and sensing of local optical and electro-optical characteristics in nanoscience. The paper brings an overview of several methods using the contrast mechanisms in optical near-field to characterize nanophotonic devices.

English abstract

The current progress in semiconductor optoelectronics, laser diodes, fast photodetectors, optical modulators, MEMS and MOEMS technology, micro- and nano-electronics development and optical manufacturing technology opens new and improved perspectives for optical sensors and measuring systems, which integrate several components in order to achieve new functionalities. To measure local characteristics of these devices, the use of near-field optics is very important because the coupling of the evanescent electromagnetic field and the radiative electromagnetic waves in the vicinity of a nano-probe placed near the boundary between allows overcome the diffraction limit of light of conventional optics. This technique could be useful to the measurement and sensing of local optical and electro-optical characteristics in nanoscience. The paper brings an overview of several methods using the contrast mechanisms in optical near-field to characterize nanophotonic devices.

Keywords

Nanophotonics, nanooptics, optical sensor, contrasts, near-field optical microscope, optical fiber probe, measurement, sensing

RIV year

2006

Released

10.10.2006

Publisher

Wroclaw University of Technology

Location

Wroclaw, Poland

ISBN

83-7085-970-4

Book

Proc. of the Symposium on Photonics Technology for the 7th Framework Programme

Pages from

51

Pages to

54

Pages count

4

URL

BibTex


@inproceedings{BUT19860,
  author="Pavel {Tománek} and Lubomír {Grmela}",
  title="Near-field optical measurement and sensing in Nanophotonics",
  annote="The current progress in semiconductor optoelectronics, laser diodes, fast photodetectors, optical modulators, MEMS and MOEMS technology, micro- and nano-electronics development and optical manufacturing technology opens new and improved perspectives for optical sensors and measuring systems, which integrate several components in order to achieve new functionalities. To measure local characteristics of these devices, the use of near-field optics is very important because the coupling of the evanescent electromagnetic field and the radiative electromagnetic waves in the vicinity of a nano-probe placed near the boundary between allows overcome the diffraction limit of light of conventional optics.  This technique could be useful to the measurement and sensing of local optical and electro-optical characteristics in nanoscience. The paper brings an overview of several methods using the contrast mechanisms in optical near-field to characterize nanophotonic devices.",
  address="Wroclaw University of Technology",
  booktitle="Proc. of the Symposium on Photonics Technology for the 7th Framework Programme",
  chapter="19860",
  howpublished="print",
  institution="Wroclaw University of Technology",
  year="2006",
  month="october",
  pages="51--54",
  publisher="Wroclaw University of Technology",
  type="conference paper"
}