Publication detail

Transparent and conductive titanium nitride thin films for implantable bioelectronics deposited at low temperature using two Kaufman ion-beam sources

JARUŠEK, J. GABLECH, I.

Original Title

Transparent and conductive titanium nitride thin films for implantable bioelectronics deposited at low temperature using two Kaufman ion-beam sources

Type

conference paper

Language

English

Original Abstract

This work proposes ultra-thin films of titanium nitride as a material for the realization of transparent and conductive layers suitable for implantable bioelectronics. Results further show that good results of crystallography, transmittance, and sheet resistance can be achieved for thin films with thicknesses of 15 nm and 20 nm deposited at the beam energy of the primary ion source of 400 eV and temperature below 100 °C.

Keywords

bioelectronics implants; sputtering; thin films; titanium nitride; transparent conducting film; visible transmittance

Authors

JARUŠEK, J.; GABLECH, I.

Released

26. 4. 2022

Publisher

Brno University of Technology, Faculty of Electrical Engineering and Communication

Location

Brno

ISBN

978-8-0214-6029-4

Book

Proceedings II of the Conference Student EEICT General papers

Edition

1

Pages from

84

Pages to

87

Pages count

4

URL

https://www.eeict.cz/eeict_download/archiv/sborniky/EEICT_2022_sbornik_1_v2.pdf

BibTex

@inproceedings{BUT187924,
  author="Jaromír {Jarušek} and Imrich {Gablech}",
  title="Transparent and conductive titanium nitride thin films for implantable bioelectronics deposited at low temperature using two Kaufman ion-beam sources",
  booktitle="Proceedings II of the Conference Student EEICT General papers",
  year="2022",
  series="1",
  pages="84--87",
  publisher="Brno University of Technology, Faculty of Electrical Engineering and Communication",
  address="Brno",
  isbn="978-8-0214-6029-4",
  url="https://www.eeict.cz/eeict_download/archiv/sborniky/EEICT_2022_sbornik_1_v2.pdf"
}