Publication detail

Chemical properties of plasma-polymerized vinyltriethoxysilane

ČECH, V., ZEMEK, J., PEŘINA, V., VANĚK, J.

Original Title

Chemical properties of plasma-polymerized vinyltriethoxysilane

Type

conference paper

Language

English

Original Abstract

Plasma-polymerized thin films of vinyltriethoxysilane were deposited on IR-transparent silicon wafers using plasma-enhanced chemical vapor deposition. Deposited films were characterized by spectroscopic techniques (RBS, ERDA, XPS, FTIR) in order to compare their elemental composition and chemical structure. We were able to influence/control the elemental composition and chemical structure of the plasma polymer films in relatively wide ranges by increasing the effective power.

Keywords

PE CVD; thin film; organosilicon; FTIR; RBS; ERDA; XPS

Authors

ČECH, V., ZEMEK, J., PEŘINA, V., VANĚK, J.

RIV year

2005

Released

1. 8. 2005

Publisher

Conference Management, Toronto

Location

Toronto, Kanada

Pages from

1

Pages to

5

Pages count

5

BibTex

@inproceedings{BUT16049,
  author="Vladimír {Čech} and Jan {Vaněk} and Vratislav {Peřina} and Josef {Zemek}",
  title="Chemical properties of plasma-polymerized vinyltriethoxysilane",
  booktitle="Proc. 17th International Symposium on Plasma Chemistry",
  year="2005",
  pages="1--5",
  publisher="Conference Management, Toronto",
  address="Toronto, Kanada"
}