Publication detail

Patterning large area plasmonic nanostructures on nonconductive substrates using variable pressure electron beam lithography

BABOCKÝ, J. DVOŘÁK, P. LIGMAJER, F. HRTOŇ, M. ŠIKOLA, T. BOK, J. FIALA, J.

Original Title

Patterning large area plasmonic nanostructures on nonconductive substrates using variable pressure electron beam lithography

English Title

Patterning large area plasmonic nanostructures on nonconductive substrates using variable pressure electron beam lithography

Type

journal article in Web of Science

Language

en

Original Abstract

Variable pressure electron beam lithography (VP-EBL) is a unique technique offering alternative cost-effective approach for patterning on nonconductive substrates that are often required for many applications in the field of plasmonics. Here, the authors present the use of the VP-EBL for accurate fabrication of nanoantennas with plasmonic resonances in visible range in order to achieve artificial sample coloring. Using confocal transmission spectroscopy, the authors show that optimized VP-EBL process enables fabrication of plasmonic nanoantennas with optical properties equivalent to those produced via traditional approach. Furthermore, the authors demonstrate high stability of the exposure process by fabricating a millimeter-sized color image composed of plasmonic nanoantennas.

English abstract

Variable pressure electron beam lithography (VP-EBL) is a unique technique offering alternative cost-effective approach for patterning on nonconductive substrates that are often required for many applications in the field of plasmonics. Here, the authors present the use of the VP-EBL for accurate fabrication of nanoantennas with plasmonic resonances in visible range in order to achieve artificial sample coloring. Using confocal transmission spectroscopy, the authors show that optimized VP-EBL process enables fabrication of plasmonic nanoantennas with optical properties equivalent to those produced via traditional approach. Furthermore, the authors demonstrate high stability of the exposure process by fabricating a millimeter-sized color image composed of plasmonic nanoantennas.

Keywords

Plasmons, Nanopatterning, Nanostructures, Scanning electron microscopy, High pressure

Released

07.11.2016

Pages from

06K801-1

Pages to

06K801-4

Pages count

4

BibTex


@article{BUT129998,
  author="Jiří {Babocký} and Petr {Dvořák} and Filip {Ligmajer} and Martin {Hrtoň} and Tomáš {Šikola} and Jan {Bok} and Jiří {Fiala}",
  title="Patterning large area plasmonic nanostructures on nonconductive substrates using variable pressure electron beam lithography",
  annote="Variable pressure electron beam lithography (VP-EBL) is a unique technique offering alternative cost-effective approach for patterning on nonconductive substrates that are often required for many applications in the field of plasmonics. Here, the authors present the use of the VP-EBL for accurate fabrication of nanoantennas with plasmonic resonances in visible range in order to achieve artificial sample coloring. Using confocal transmission spectroscopy, the authors show that optimized VP-EBL process enables fabrication of plasmonic nanoantennas with optical properties equivalent to those produced via traditional approach. Furthermore, the authors demonstrate high stability of the exposure process by fabricating a millimeter-sized color image composed of plasmonic nanoantennas.",
  chapter="129998",
  doi="10.1116/1.4966959",
  howpublished="online",
  number="6",
  volume="34",
  year="2016",
  month="november",
  pages="06K801-1--06K801-4",
  type="journal article in Web of Science"
}