Transparent Protective Coating by Plasma Polymerization of Vinyltrimethylsilane or Hexamethyldisilazane and Oxygen Post-treatment

abstract

English

functional and well adhesive organic silicon thin film, which provides lower refractive index and the structure can be changed from organic to inorganic after oxygen plasma oxidation. In this study, we compared films deposited from RF plasma (13.56 MHz) vinyltetramethylsilane gas (VTMS, monomer) or hexamethyldisilazane (HMDSZ) on silicon wafers, PET, and glass sheet substrates. Substrates were post-treated by using oxygen plasma to create stable hydrophilic oxide surface. Results show that the growth rate of film thickness deposited on glass and silicon by VTMS or HMDSZ under 30W, 100mtorr, is about 14nm/min. The water contact angle of surface increased from 40 to about 90 degree, indicating the hydrophobic and kept stable for 10 days. However, after oxygen plasma post treatment, the surface turned from hydrophobic to hydrophilic, as water contact angle changed from 90 to about 15 degrees for HMDSZ (40 mtorr, 3 min, 25 W), and 25 degrees for VTMS(25W, 60mtorr, 5min). The transmittance rate of thin film in UV-VIS spectra modified glass was increased from 90 to 94%. The refractive index of deposited films was 1.46~1.50 in HMDSZ or VTMS.

plasma polymerization; thin films

CHEN, K.; LIU, W.; ČECH, V.; INAGAKI, N.

15. 9. 2014

Germany

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