Publication detail

Thin Film Deposition of HMDSO for Barrier Applications in Archaeology

PROCHÁZKA, M. BLAHOVÁ, L. KRČMA, F.

Original Title

Thin Film Deposition of HMDSO for Barrier Applications in Archaeology

English Title

Thin Film Deposition of HMDSO for Barrier Applications in Archaeology

Type

conference paper

Language

en

Original Abstract

Thin film chemical vapour deposition technique has been used for more than 50 years. Introducing organosilicones as precursors, e.g. hexamethyldisiloxane (HMDSO) or tetraethyl orthosilicate (TEOS), brought new possibilities to this method. Barrier properties of thin films have become an important issue, especially for army and emergency services as well as for food and drink manufacturers. Our work is focused on deposition of protective HMDSO thin films via plasma enhanced chemical vapour deposition for encapsulating cleaned archaeological artefacts, preventing these historical objects from destructive corrosion objects.

English abstract

Thin film chemical vapour deposition technique has been used for more than 50 years. Introducing organosilicones as precursors, e.g. hexamethyldisiloxane (HMDSO) or tetraethyl orthosilicate (TEOS), brought new possibilities to this method. Barrier properties of thin films have become an important issue, especially for army and emergency services as well as for food and drink manufacturers. Our work is focused on deposition of protective HMDSO thin films via plasma enhanced chemical vapour deposition for encapsulating cleaned archaeological artefacts, preventing these historical objects from destructive corrosion objects.

Keywords

PECVD, barrier coating, HMDSO, OTR

RIV year

2014

Released

26.08.2014

Location

Belgrade

ISBN

978-86-7762-600-6

Book

Book of Contributed Papers of 27th Summer School and International Symposium on the Physics of Ionized Gases

Pages from

218

Pages to

221

Pages count

4

BibTex


@inproceedings{BUT109505,
  author="Michal {Procházka} and Lucie {Blahová} and František {Krčma}",
  title="Thin Film Deposition of HMDSO for Barrier Applications in Archaeology",
  annote="Thin film chemical vapour deposition technique has been used for more than 50 years. Introducing organosilicones as precursors, e.g. hexamethyldisiloxane (HMDSO) or tetraethyl orthosilicate (TEOS), brought new possibilities to this method. Barrier properties of thin films have become an important issue, especially for army and emergency services as well as for food and drink manufacturers. Our work is focused on deposition of protective HMDSO thin films via plasma enhanced chemical vapour deposition for encapsulating cleaned archaeological artefacts, preventing these historical objects from destructive corrosion objects.",
  booktitle="Book of Contributed Papers of 27th Summer School and International Symposium on the Physics of Ionized Gases",
  chapter="109505",
  howpublished="print",
  year="2014",
  month="august",
  pages="218--221",
  type="conference paper"
}