Publication detail

PECVD Characterization During the Deposition of Thin Fluorocarbon Films

BALAŠTÍKOVÁ, R. KRČMA, F. TATOULIAN, M.

Original Title

PECVD Characterization During the Deposition of Thin Fluorocarbon Films

English Title

PECVD Characterization During the Deposition of Thin Fluorocarbon Films

Type

abstract

Language

en

Original Abstract

This presentation focuses on plasma diagnostic of the deposition process during the preparation of the thin film prepared by a PECVD technique. The discharge was monitored using optical emission spectroscopy and in situ mass spectrometry.

English abstract

This presentation focuses on plasma diagnostic of the deposition process during the preparation of the thin film prepared by a PECVD technique. The discharge was monitored using optical emission spectroscopy and in situ mass spectrometry.

Keywords

PECVD, fluorocarbon thin films, plasma diagnostics

Released

28.04.2013

Publisher

Eindhoven University

Location

Eindhoven

Pages from

P1-2

Pages to

P1-2

Pages count

1

BibTex


@misc{BUT101793,
  author="Radka {Veverková} and František {Krčma} and Michael {Tatoulian}",
  title="PECVD Characterization During the Deposition of Thin Fluorocarbon Films",
  annote="This presentation focuses on plasma diagnostic of the deposition process during the preparation of the thin film prepared by a PECVD technique. The discharge was monitored using optical emission spectroscopy and in situ mass spectrometry.",
  address="Eindhoven University",
  booktitle="10th Frontiers in Low Temperature Plasma Diagnostics – Book of Abstracts",
  chapter="101793",
  howpublished="print",
  institution="Eindhoven University",
  year="2013",
  month="april",
  pages="P1-2--P1-2",
  publisher="Eindhoven University",
  type="abstract"
}