Publication detail

Negatively Charged Al2O3 Layers Deposited by Magnetron Sputtering and Vacuum Evaporation for Crystalline Silicon Solar Cell BSF

HÉGR, O. BAŘINKA, R. PORUBA, A.

Original Title

Negatively Charged Al2O3 Layers Deposited by Magnetron Sputtering and Vacuum Evaporation for Crystalline Silicon Solar Cell BSF

English Title

Negatively Charged Al2O3 Layers Deposited by Magnetron Sputtering and Vacuum Evaporation for Crystalline Silicon Solar Cell BSF

Type

conference paper

Language

en

Original Abstract

The main goal of our work is utilization of well established vacuum technologies as magnetron sputtering and vacuum evaporation for transfer of the aluminum oxide deposition process from ALD (Atomic layer deposition) technique to the industrial sputtering system with the aim to implement high quality back-surface field (BSF) passivation into a large and effective deposition system in the technology processes of Solartec company. The passivation effect is tested by MW-PCD (Microwave Photoconductance Decay) measuring method with deposition of identical passivation layers on both sides of Czochralski (CZ) p- and n-type substrates.

English abstract

The main goal of our work is utilization of well established vacuum technologies as magnetron sputtering and vacuum evaporation for transfer of the aluminum oxide deposition process from ALD (Atomic layer deposition) technique to the industrial sputtering system with the aim to implement high quality back-surface field (BSF) passivation into a large and effective deposition system in the technology processes of Solartec company. The passivation effect is tested by MW-PCD (Microwave Photoconductance Decay) measuring method with deposition of identical passivation layers on both sides of Czochralski (CZ) p- and n-type substrates.

Keywords

ALD, magnetron sputtering, vacuum evaporation, Back-Side Field, rear side passivation

RIV year

2011

Released

31.10.2011

Publisher

WIP Wirtschaft und Infrastruktur GmbH & Co Planungs KG

Location

Sylvensteinstr. 2 81369 München Germany

ISBN

3-936338-27-2

Book

EU PVSEC Proceedings, 26th European Photovoltaic Solar Energy Conference and Exhibition

Pages from

1783

Pages to

1786

Pages count

4

BibTex


@inproceedings{BUT74209,
  author="Ondřej {Hégr} and Radim {Bařinka} and Aleš {Poruba}",
  title="Negatively Charged Al2O3 Layers Deposited by Magnetron Sputtering and Vacuum Evaporation for Crystalline Silicon Solar Cell BSF",
  annote="The main goal of our work is utilization of well established vacuum technologies as magnetron sputtering and vacuum evaporation for transfer of the aluminum oxide deposition process from ALD (Atomic layer deposition) technique to the industrial sputtering system with the aim to implement high quality back-surface field (BSF) passivation into a large and effective deposition system in the technology processes of Solartec company. The passivation effect is tested by MW-PCD (Microwave Photoconductance Decay) measuring method with deposition of identical passivation layers on both sides of Czochralski (CZ) p- and n-type substrates.",
  address="WIP Wirtschaft und Infrastruktur GmbH & Co Planungs KG",
  booktitle="EU PVSEC Proceedings, 26th European Photovoltaic Solar Energy Conference and Exhibition",
  chapter="74209",
  howpublished="electronic, physical medium",
  institution="WIP Wirtschaft und Infrastruktur GmbH & Co Planungs KG",
  year="2011",
  month="october",
  pages="1783--1786",
  publisher="WIP Wirtschaft und Infrastruktur GmbH & Co Planungs KG",
  type="conference paper"
}