Publication detail

Chemical vapor deposition: a potential tool for wafer scale growth of two-dimensional layered materials

EL HAMMOUMI, M. CHAUDHARY, V. NEUGEBAUER, P. EL FATIMY, A.

Original Title

Chemical vapor deposition: a potential tool for wafer scale growth of two-dimensional layered materials

Type

journal article in Web of Science

Language

English

Original Abstract

The rapidly growing demand for high-performance and low-power electronic and photonic devices has driven attention towards novel two-dimensional (2D) layered materials. In this regard, 2D layered materials, including graphene, molybdenum disulfide (MoS2), and newly discovered phosphorene, have the potential to take over the existing semiconductor industry due to their intriguing features, such as excellent electrical conductivity, strong light-matter interaction, and especially the ability to scale down the resulting device to the atomic level. However, to explore the full potential of these materials in various technological applications, it is essential to develop a large-scale synthesis method that can provide uniform, defect-free thin film. The chemical vapor deposition (CVD) technique has been proven to produce large-scale and less defective 2D crystals with reasonably good quality and uniformity compared to other elaboration techniques, such as molecular beam epitaxy. This article discusses whether CVD may improve 2D layered materials growth, including graphene and MoS2, and whether it can be used to grow phosphorene. Only a few attempts have been made using CVD-like methods to grow phosphorene directly on the substrate. Still, one has to go long to establish a proper CVD method for phosphorene synthesis.

Keywords

2D materials; CVD; graphene; MoS2; black phosphorus; phosphorene

Authors

EL HAMMOUMI, M.; CHAUDHARY, V.; NEUGEBAUER, P.; EL FATIMY, A.

Released

24. 11. 2022

Publisher

IOP Publishing Ltd

Location

BRISTOL

ISBN

1361-6463

Periodical

Journal of Physics D - Applied Physics

Year of study

55

Number

47

State

United Kingdom of Great Britain and Northern Ireland

Pages count

18

URL

https://iopscience.iop.org/article/10.1088/1361-6463/ac928d

Full text in the Digital Library

http://hdl.handle.net/11012/209153

BibTex

@article{BUT182303,
  author="Mohammed {El Hammoumi} and Vivek {Chaudhary} and Petr {Neugebauer} and Abdelouahad {El Fatimy}",
  title="Chemical vapor deposition: a potential tool for wafer scale growth of two-dimensional layered materials",
  journal="Journal of Physics D - Applied Physics",
  year="2022",
  volume="55",
  number="47",
  pages="18",
  doi="10.1088/1361-6463/ac928d",
  issn="1361-6463",
  url="https://iopscience.iop.org/article/10.1088/1361-6463/ac928d"
}