Publication detail

Deposition and in situ characterization of ultra-thin films

VOBORNÝ, S., KOLÍBAL, M., MACH, J., ČECHAL, J., BÁBOR, P., PRŮŠA, S., SPOUSTA, J., ŠIKOLA, T.

Original Title

Deposition and in situ characterization of ultra-thin films

English Title

Deposition and in situ characterization of ultra-thin films

Type

conference paper

Language

en

Original Abstract

Deposition of ultra-thin GaN layers and their analysis using XPS, SIMS, TOF-LEIS.

English abstract

Deposition of ultra-thin GaN layers and their analysis using XPS, SIMS, TOF-LEIS.

RIV year

2003

Released

23.06.2003

Publisher

EVC

Location

Berlin

Pages from

45

Pages to

46

Pages count

2

Documents

BibTex


@inproceedings{BUT11053,
  author="Stanislav {Voborný} and Miroslav {Kolíbal} and Jindřich {Mach} and Jan {Čechal} and Petr {Bábor} and Stanislav {Průša} and Jiří {Spousta} and Tomáš {Šikola}",
  title="Deposition and in situ characterization of ultra-thin films",
  annote="Deposition of ultra-thin GaN layers and their analysis using XPS, SIMS, TOF-LEIS.",
  address="EVC",
  booktitle="EVC'03 Abstracts",
  chapter="11053",
  institution="EVC",
  year="2003",
  month="june",
  pages="45",
  publisher="EVC",
  type="conference paper"
}