This project is co-financed with state support of the CR Technological Agency as part of 2. veřejná soutěž: Programu Národní centra kompetence
www.tacr.cz
Research useful for society.

Project detail

Lithography Techniques

Duration: 01.04.2023 — 31.12.2025

Funding resources

Technologická agentura ČR - 2. veřejná soutěž: Program Národní centra kompetence

- whole funder

On the project

The motivation of this sub–project is the development of technology processes and design rules for specific optical elements in VIS/UV regions, metasurfaces and particle traps.

Keywords
Lithography Techniques

Mark

TN02000020/020

Default language

English

People responsible

Ligmajer Filip, Ing., Ph.D. - principal person responsible

Units

Fabrication and Characteris. of Nanostr.
- (2023-03-16 - not assigned)

Responsibility: Ligmajer Filip, Ing., Ph.D.