Detail publikace

Protection by Deposition of Parylene and SiOx Thin Films

BALAŠTÍKOVÁ, R. PROCHÁZKA, M. MENČÍK, P. HORÁK, J. PŘIKRYL, R. KRČMA, F.

Originální název

Protection by Deposition of Parylene and SiOx Thin Films

Anglický název

Protection by Deposition of Parylene and SiOx Thin Films

Jazyk

en

Originální abstrakt

This study focuses on possibilities of the archaeological artefacts (copper, iron, brass and bronze) protection by a thin film deposition of SiOx and Parylene thin films. Parylene coatings are prepared by the standard chemical vapor deposition (CVD) method. SiOx layers were deposited by PECVD in a low pressure reactor with capacitively coupled plasma discharge (13.56 MHz). The coatings were characterized by various methods in order to obtain information about their chemical structure (FTIR) and elemental composition (XPS), surface morphology (SEM) and barrier properties (OTR).

Anglický abstrakt

This study focuses on possibilities of the archaeological artefacts (copper, iron, brass and bronze) protection by a thin film deposition of SiOx and Parylene thin films. Parylene coatings are prepared by the standard chemical vapor deposition (CVD) method. SiOx layers were deposited by PECVD in a low pressure reactor with capacitively coupled plasma discharge (13.56 MHz). The coatings were characterized by various methods in order to obtain information about their chemical structure (FTIR) and elemental composition (XPS), surface morphology (SEM) and barrier properties (OTR).

Dokumenty

BibTex


@inproceedings{BUT96892,
  author="Radka {Veverková} and Michal {Procházka} and Přemysl {Menčík} and Jakub {Horák} and Radek {Přikryl} and František {Krčma}",
  title="Protection by Deposition of Parylene and SiOx Thin Films",
  annote="This study focuses on possibilities of the archaeological artefacts (copper, iron, brass and bronze) protection by a thin film deposition of SiOx and Parylene thin films. Parylene coatings are prepared by the standard chemical vapor deposition (CVD) method. SiOx layers were deposited by PECVD in a low pressure reactor with capacitively coupled plasma discharge (13.56 MHz). The coatings were characterized by various methods in order to obtain information about their chemical structure (FTIR) and elemental composition (XPS), surface morphology (SEM) and barrier properties (OTR).",
  booktitle="Potential and Applications of Surface Nanotreatment of Polymers and Glass - Book of Abstracts",
  chapter="96892",
  howpublished="print",
  year="2012",
  month="october",
  pages="32--34",
  type="conference paper"
}