Detail publikace

In-situ Monitoring of Thin Film Depositon Process Using Optical Emission Spectroscopy

PROCHÁZKA, M. BLAHOVÁ, L. KRČMA, F. PŘIKRYL, R.

Originální název

In-situ Monitoring of Thin Film Depositon Process Using Optical Emission Spectroscopy

Anglický název

In-situ Monitoring of Thin Film Depositon Process Using Optical Emission Spectroscopy

Jazyk

en

Originální abstrakt

Plasma enhanced chemical vapour deposition (PECVD) has become more and more popular for thin film deposition, especially using organosilicon precursors. This work focuses on high density films deposited by PECVD using hexamethyldisiloxane precursor. Optical emission spectroscopy was used for plasma diagnostics. Oxygen transmission rate and infrared spectra of deposited layers were measured. Optimal experimental conditions for low carbon content layers and layers with good barrier properties were determined.

Anglický abstrakt

Plasma enhanced chemical vapour deposition (PECVD) has become more and more popular for thin film deposition, especially using organosilicon precursors. This work focuses on high density films deposited by PECVD using hexamethyldisiloxane precursor. Optical emission spectroscopy was used for plasma diagnostics. Oxygen transmission rate and infrared spectra of deposited layers were measured. Optimal experimental conditions for low carbon content layers and layers with good barrier properties were determined.

Dokumenty

BibTex 


@inproceedings{BUT93226,
  author="Michal {Procházka} and Lucie {Blahová} and František {Krčma} and Radek {Přikryl}",
  title="In-situ Monitoring of Thin Film Depositon Process Using Optical Emission Spectroscopy",
  annote="Plasma enhanced chemical vapour deposition (PECVD) has become more and more popular for thin film deposition, especially using organosilicon precursors. This work focuses on high density films deposited by PECVD using hexamethyldisiloxane precursor. Optical emission spectroscopy was used for plasma diagnostics. Oxygen transmission rate and infrared spectra of deposited layers were measured. Optimal experimental conditions for low carbon content layers and layers with good barrier properties were determined.",
  address="EPS",
  booktitle="Europhysics Conference Abstracts",
  chapter="93226",
  howpublished="electronic, physical medium",
  institution="EPS",
  year="2012",
  month="july",
  pages="P3.5.71--P3.5.72",
  publisher="EPS",
  type="conference paper"
}