Detail publikace

Plasma polymerisation of methylphenylsilane

Originální název

Plasma polymerisation of methylphenylsilane

Anglický název

Plasma polymerisation of methylphenylsilane

Jazyk

en

Originální abstrakt

Microwave electron cyclotron resonance plasma afterglow chemical vapour deposition (MW ECR PA CVD) and radio frequency plasma enhanced CVD (RF PE CVD) of plasma-poly(methylphenylsilane) (p-PMPS) were examined according to plasma composition and resulting thin film properties. Direct mass spectrometry monitoring and gas chromatography and mass spectroscopy (GC MS) of cold-trapped plasma products were used. Deposited samples were measured mainly on luminescence. The low pressure MW ECR plasma creates species for layer growth by a smaller average number of inelastic collisions per origin of monomer molecule. The exploitation of monomer reaches 23% in comparison with RF plasma and the deposition rate is larger in comparison with RF plasma . The inelastic collision rate is primarily more important for growing layers than the power introduced into plasma. The luminescence spectra of both MW and RF samples are compared.

Anglický abstrakt

Microwave electron cyclotron resonance plasma afterglow chemical vapour deposition (MW ECR PA CVD) and radio frequency plasma enhanced CVD (RF PE CVD) of plasma-poly(methylphenylsilane) (p-PMPS) were examined according to plasma composition and resulting thin film properties. Direct mass spectrometry monitoring and gas chromatography and mass spectroscopy (GC MS) of cold-trapped plasma products were used. Deposited samples were measured mainly on luminescence. The low pressure MW ECR plasma creates species for layer growth by a smaller average number of inelastic collisions per origin of monomer molecule. The exploitation of monomer reaches 23% in comparison with RF plasma and the deposition rate is larger in comparison with RF plasma . The inelastic collision rate is primarily more important for growing layers than the power introduced into plasma. The luminescence spectra of both MW and RF samples are compared.

BibTex


@article{BUT46370,
  author="Ota {Salyk} and Pavel {Broža} and Norbert {Dokoupil} and Radim {Herrmann} and Ivo {Kuřitka} and Jiří {Pryček} and Martin {Weiter}",
  title="Plasma polymerisation of methylphenylsilane",
  annote="Microwave electron cyclotron resonance plasma afterglow chemical vapour deposition (MW ECR PA CVD) and radio frequency plasma
enhanced CVD (RF PE CVD) of plasma-poly(methylphenylsilane) (p-PMPS) were examined according to plasma composition and resulting
thin film properties. Direct mass spectrometry monitoring and gas chromatography and mass spectroscopy (GC MS) of cold-trapped plasma
products were used. Deposited samples were measured mainly on luminescence. The low pressure MW ECR plasma creates species for layer
growth by a smaller average number of inelastic collisions per origin of monomer molecule. The exploitation of monomer reaches 23% in
comparison with RF plasma and the deposition rate is larger  in comparison with RF plasma . The inelastic
collision rate is primarily more important for growing layers than the power introduced into plasma. The luminescence spectra of both MW
and RF samples are compared.",
  address="Elsevier",
  chapter="46370",
  institution="Elsevier",
  journal="Surface and Coatings Technology",
  number="1-4",
  volume="200",
  year="2005",
  month="september",
  pages="486--489",
  publisher="Elsevier",
  type="journal article - other"
}