Detail publikace

Application of Complex UHV Apparaturus in a Study of Low-tepmerature Gallium-nitride Ultrathin Film Growth

VOBORNÝ, S. MACH, J. ČECHAL, J. KOSTELNÍK, P. TOMANEC, O. BÁBOR, P. SPOUSTA, J. ŠIKOLA, T.

Originální název

Application of Complex UHV Apparaturus in a Study of Low-tepmerature Gallium-nitride Ultrathin Film Growth

Anglický název

Application of Complex UHV Apparaturus in a Study of Low-tepmerature Gallium-nitride Ultrathin Film Growth

Jazyk

en

Originální abstrakt

Paper deals with the application of Complex UHV Apparaturus in a Study of Low-tepmerature Gallium-nitride Ultrathin Film Growth

Anglický abstrakt

Paper deals with the application of Complex UHV Apparaturus in a Study of Low-tepmerature Gallium-nitride Ultrathin Film Growth

Dokumenty

BibTex


@article{BUT42366,
  author="Stanislav {Voborný} and Jindřich {Mach} and Jan {Čechal} and Petr {Kostelník} and Ondřej {Tomanec} and Petr {Bábor} and Jiří {Spousta} and Tomáš {Šikola}",
  title="Application of Complex UHV Apparaturus in a Study of Low-tepmerature Gallium-nitride Ultrathin Film Growth",
  annote="Paper deals with the application of Complex UHV Apparaturus in a Study of Low-tepmerature Gallium-nitride Ultrathin Film Growth",
  chapter="42366",
  journal="Jemná mechanika a optika",
  number="9",
  volume="9",
  year="2004",
  month="january",
  pages="265",
  type="journal article - other"
}