Detail publikace

Non-lineartiy changes induced by current stress in thick film resistors

Originální název

Non-lineartiy changes induced by current stress in thick film resistors

Anglický název

Non-lineartiy changes induced by current stress in thick film resistors

Jazyk

en

Originální abstrakt

Non-linearity measurements are widely used for quality and reliability testing of passive components. The main non-linearity sources in the ruthenium based thick film resistors are the transitions between conducting grains in the resistive paste volume, and the defects and cracks in the resistive layer and resistor/contact interface. The third harmonic voltage measurements are offered to investigate the effect of the degradation mechanism in thick film resistors after high current pulses. We applied to the resistors three short current pulses (t = 5 ms) with current density Jmax reaching 100times value of nominal current density JNom. This is sufficient to screen unstable devices. Third harmonic voltage (THV) and resistance were measured before and after the pulse stressing. We have found good correlation between relative change of THV and relative change of resistance, however THV measurements are about 5 times more sensitive. THV change after pulse stressing is proportional to the number of pulses, with linear dependence on the beginning of testing. For 10 pulses applied to samples with geometry 0.3x0.3 mm2 the saturation of THV value was observed and for some samples the THV value decreases after saturation.

Anglický abstrakt

Non-linearity measurements are widely used for quality and reliability testing of passive components. The main non-linearity sources in the ruthenium based thick film resistors are the transitions between conducting grains in the resistive paste volume, and the defects and cracks in the resistive layer and resistor/contact interface. The third harmonic voltage measurements are offered to investigate the effect of the degradation mechanism in thick film resistors after high current pulses. We applied to the resistors three short current pulses (t = 5 ms) with current density Jmax reaching 100times value of nominal current density JNom. This is sufficient to screen unstable devices. Third harmonic voltage (THV) and resistance were measured before and after the pulse stressing. We have found good correlation between relative change of THV and relative change of resistance, however THV measurements are about 5 times more sensitive. THV change after pulse stressing is proportional to the number of pulses, with linear dependence on the beginning of testing. For 10 pulses applied to samples with geometry 0.3x0.3 mm2 the saturation of THV value was observed and for some samples the THV value decreases after saturation.

BibTex


@inproceedings{BUT31367,
  author="Vlasta {Sedláková} and František {Melkes} and Pavel {Dobis} and Josef {Šikula} and Munecazu {Tacano} and Sumihisa {Hashiguchi}",
  title="Non-lineartiy changes induced by current stress in thick film resistors",
  annote="Non-linearity measurements are widely used for quality and reliability testing of passive components. The main non-linearity sources in the ruthenium based thick film resistors are the transitions between conducting grains in the resistive paste volume, and the defects and cracks in the resistive layer and resistor/contact interface. The third harmonic voltage measurements are offered to investigate the effect of the degradation mechanism in thick film resistors after high current pulses. We applied to the resistors three short current pulses (t = 5 ms) with current density Jmax reaching 100times value of nominal current density JNom. This is sufficient to screen unstable devices. Third harmonic voltage (THV) and resistance were measured before and after the pulse stressing.  We have found good correlation between relative change of THV and relative change of resistance, however THV measurements are about 5 times more sensitive. THV change after pulse stressing is proportional to the number of pulses, with linear dependence on the beginning of testing. For 10 pulses applied to samples with geometry 0.3x0.3 mm2 the saturation of THV value was observed and for some samples the THV value decreases after saturation.",
  address="ECA",
  booktitle="24th Capacitor and Resistor Technology Symposium",
  chapter="31367",
  institution="ECA",
  journal="Capacitor and Resistor Technology",
  number="24",
  year="2004",
  month="january",
  pages="154",
  publisher="ECA",
  type="conference paper"
}