Detail publikace

Transparent and conductive titanium nitride thin films for implantable bioelectronics deposited at low temperature using two Kaufman ion-beam sources

JARUŠEK, J. GABLECH, I.

Originální název

Transparent and conductive titanium nitride thin films for implantable bioelectronics deposited at low temperature using two Kaufman ion-beam sources

Typ

článek ve sborníku ve WoS nebo Scopus

Jazyk

angličtina

Originální abstrakt

This work proposes ultra-thin films of titanium nitride as a material for the realization of transparent and conductive layers suitable for implantable bioelectronics. Results further show that good results of crystallography, transmittance, and sheet resistance can be achieved for thin films with thicknesses of 15 nm and 20 nm deposited at the beam energy of the primary ion source of 400 eV and temperature below 100 °C.

Klíčová slova

bioelectronics implants; sputtering; thin films; titanium nitride; transparent conducting film; visible transmittance

Autoři

JARUŠEK, J.; GABLECH, I.

Vydáno

26. 4. 2022

Nakladatel

Brno University of Technology, Faculty of Electrical Engineering and Communication

Místo

Brno

ISBN

978-8-0214-6029-4

Kniha

Proceedings II of the Conference Student EEICT General papers

Edice

1

Strany od

84

Strany do

87

Strany počet

4

URL

https://www.eeict.cz/eeict_download/archiv/sborniky/EEICT_2022_sbornik_1_v2.pdf

BibTex

@inproceedings{BUT187924,
  author="Jaromír {Jarušek} and Imrich {Gablech}",
  title="Transparent and conductive titanium nitride thin films for implantable bioelectronics deposited at low temperature using two Kaufman ion-beam sources",
  booktitle="Proceedings II of the Conference Student EEICT General papers",
  year="2022",
  series="1",
  pages="84--87",
  publisher="Brno University of Technology, Faculty of Electrical Engineering and Communication",
  address="Brno",
  isbn="978-8-0214-6029-4",
  url="https://www.eeict.cz/eeict_download/archiv/sborniky/EEICT_2022_sbornik_1_v2.pdf"
}