Detail publikace

Iinfluence of Solution Properties and Gas Addition on Hydrogen Peroxide Production by a Novel Plasma SOurce Generation Non-Pulsing Discharge in Liquids

KOZÁKOVÁ, Z. KRČMA, F. MOŽÍŠOVÁ, A. DÜRROVÁ, A.

Originální název

Iinfluence of Solution Properties and Gas Addition on Hydrogen Peroxide Production by a Novel Plasma SOurce Generation Non-Pulsing Discharge in Liquids

Anglický název

Iinfluence of Solution Properties and Gas Addition on Hydrogen Peroxide Production by a Novel Plasma SOurce Generation Non-Pulsing Discharge in Liquids

Jazyk

en

Originální abstrakt

The paper evaluates concentration of hydrogen peroxide produced by a novel pin-hole plasma source in electrolyte solutions with or without gas addition. An effective production rate of hydrogen peroxide is decreased by the increased argon as well as oxygen flow rate through the plasma region. Further, it is enhanced by higher solution conductivity while it is decreased in the strongly basic conditions with the highest pH values.

Anglický abstrakt

The paper evaluates concentration of hydrogen peroxide produced by a novel pin-hole plasma source in electrolyte solutions with or without gas addition. An effective production rate of hydrogen peroxide is decreased by the increased argon as well as oxygen flow rate through the plasma region. Further, it is enhanced by higher solution conductivity while it is decreased in the strongly basic conditions with the highest pH values.

Dokumenty

BibTex


@inproceedings{BUT160137,
  author="Zdenka {Kozáková} and František {Krčma} and Aneta {Možíšová} and Anastasia {Dürrová}",
  title="Iinfluence of Solution Properties and Gas Addition on Hydrogen Peroxide Production by a Novel Plasma SOurce Generation Non-Pulsing Discharge in Liquids",
  annote="The paper evaluates concentration of hydrogen peroxide produced by a novel pin-hole plasma source in electrolyte solutions with or without gas addition. An effective production rate of hydrogen peroxide is decreased by the increased argon as well as oxygen flow rate through the plasma region. Further, it is enhanced by higher solution conductivity while it is decreased in the strongly basic conditions with the highest pH values.",
  booktitle="22nd Symposium on Application of Plasma Processes and 11th EU-Japan Joint Symposium on Plasma Processing, Book of Contributed Papers",
  chapter="160137",
  howpublished="electronic, physical medium",
  year="2019",
  month="january",
  pages="335--337",
  type="conference paper"
}