Detail publikace

Evaluation of Ni/n-SiC ohmic contacts by current noise measurements

TACANO, M., TANUMA, N., YOKOKURA, S., HASHIGUCHI, S., ŠIKULA, J., MATSUI, T.

Originální název

Evaluation of Ni/n-SiC ohmic contacts by current noise measurements

Typ

článek ve sborníku ve WoS nebo Scopus

Jazyk

angličtina

Originální abstrakt

Ohmic contacts were prepared on the Si surface of the wide band gap semiconductor n-SiC etched by Ar ECR plasma and low-frequency current-noise characteristics of ohmic contacts were investigated.

Klíčová slova v angličtině

contacts, noise, n-SiC

Autoři

TACANO, M., TANUMA, N., YOKOKURA, S., HASHIGUCHI, S., ŠIKULA, J., MATSUI, T.

Rok RIV

2001

Vydáno

1. 1. 2001

Nakladatel

World Scientific

Místo

Gainesville, USA

ISBN

981-02-4677-3

Kniha

Proceedings of the 16th Int Conf Noise in Physical Systems and 1/f Fluctuations ICNF 2001

Strany od

119

Strany do

122

Strany počet

4

BibTex

@{BUT70477
}