Detail publikace

Investigation of Contact Formation during Silicon Solar Cell Production

MOJROVÁ, B. BUCK, T.

Originální název

Investigation of Contact Formation during Silicon Solar Cell Production

Anglický název

Investigation of Contact Formation during Silicon Solar Cell Production

Jazyk

en

Originální abstrakt

This article deals with the investigation of the influence of sintering conditions on the formation process of screen printed contacts on passivated boron doped P+ emitters. The experiment was focused on measuring of resistance changes of two thick film pastes during firing processes with different conditions. Two different temperature profiles were compared at an atmospheric concentration of O2. The influence of the O2 concentration on resistance was investigated for one profile. A rapid thermal processing furnace modified for in-situ resistance measurements was used. The change of resistance was measured simultaneously with the temperature

Anglický abstrakt

This article deals with the investigation of the influence of sintering conditions on the formation process of screen printed contacts on passivated boron doped P+ emitters. The experiment was focused on measuring of resistance changes of two thick film pastes during firing processes with different conditions. Two different temperature profiles were compared at an atmospheric concentration of O2. The influence of the O2 concentration on resistance was investigated for one profile. A rapid thermal processing furnace modified for in-situ resistance measurements was used. The change of resistance was measured simultaneously with the temperature

Dokumenty

BibTex


@inproceedings{BUT117626,
  author="Barbora {Mojrová} and Thomas {Buck}",
  title="Investigation of Contact Formation during Silicon Solar Cell Production",
  annote="This article deals with the investigation of the influence of sintering conditions on the formation process of screen printed contacts on passivated boron doped P+ emitters. The experiment was focused on measuring of resistance changes of two thick film pastes during firing processes with different conditions. Two different temperature profiles were compared at an atmospheric concentration of O2. The influence of the O2 concentration on resistance was investigated for one profile. A rapid thermal processing furnace modified for in-situ resistance measurements was used. The change of resistance was measured simultaneously with the temperature",
  booktitle="IMAPS Flash conference 2015",
  chapter="117626",
  howpublished="print",
  year="2015",
  month="october",
  pages="19--20",
  type="conference paper"
}