Detail publikace

AFM zobrazování a fraktální analýza drsnosti povrchu AlN na safírových substrátů

DALLAEVA, D. TALU, S. STACH, S. ŠKARVADA, P. TOMÁNEK, P. GRMELA, L.

Originální název

AFM imaging and fractal analysis of surface roughness of AlN epilayers on sapphire substrates

Český název

AFM zobrazování a fraktální analýza drsnosti povrchu AlN na safírových substrátů

Anglický název

AFM imaging and fractal analysis of surface roughness of AlN epilayers on sapphire substrates

Typ

článek v časopise

Jazyk

en

Originální abstrakt

The paper deals with AFM imaging and characterization of 3D surface morphology of aluminum nitride (AlN) epilayers on sapphire substrates prepared by magnetron sputtering. Due to the effect of temperature changes on epilayer's surface during the fabrication, a surface morphology is studied by combination of atomic force microscopy (AFM) and fractal analysis methods. Both methods are useful tools that may assist manufacturers in developing and fabricating AlN thin films with optimal surface characteristics. Furthermore, they provide different yet complementary information to that offered by traditional surface statistical parameters. This combination is used for the first time for measurement on AlN epilayers on sapphire substrates, and provides the overall 3D morphology of the sample surfaces (by AFM imaging), and reveals fractal characteristics in the surface morphology (fractal analysis).

Český abstrakt

Příspěvek se zabývá AFM zobrazování a charakterizaci 3D povrchové morfologie nitridu hliníku na safírovém substrátu.

Anglický abstrakt

The paper deals with AFM imaging and characterization of 3D surface morphology of aluminum nitride (AlN) epilayers on sapphire substrates prepared by magnetron sputtering. Due to the effect of temperature changes on epilayer's surface during the fabrication, a surface morphology is studied by combination of atomic force microscopy (AFM) and fractal analysis methods. Both methods are useful tools that may assist manufacturers in developing and fabricating AlN thin films with optimal surface characteristics. Furthermore, they provide different yet complementary information to that offered by traditional surface statistical parameters. This combination is used for the first time for measurement on AlN epilayers on sapphire substrates, and provides the overall 3D morphology of the sample surfaces (by AFM imaging), and reveals fractal characteristics in the surface morphology (fractal analysis).

Klíčová slova

Nitrid hliníku; Epitaxy; Substrát; Drsnost povrchu; Mikroskopie atomárních sil; Fraktální analýza

Rok RIV

2014

Vydáno

01.09.2014

Nakladatel

Elsevier

Strany od

81

Strany do

86

Strany počet

6

BibTex


@article{BUT108712,
  author="Dinara {Sobola} and Stefan {Talu} and Sebastian {Stach} and Pavel {Škarvada} and Pavel {Tománek} and Lubomír {Grmela}",
  title="AFM imaging and fractal analysis of surface roughness of AlN epilayers on sapphire substrates",
  annote="The paper deals with AFM imaging and characterization of 3D surface morphology of aluminum nitride (AlN) epilayers on sapphire substrates prepared by magnetron sputtering. Due to the effect of temperature changes on epilayer's surface during the fabrication, a surface morphology is studied by combination of atomic force microscopy (AFM) and fractal analysis methods. Both methods are useful tools that may assist manufacturers in developing and fabricating AlN thin films with optimal surface characteristics. Furthermore, they provide different yet complementary information to that offered by traditional surface statistical parameters. This combination is used for the first time for measurement on AlN epilayers on sapphire substrates, and provides the overall 3D morphology of the sample surfaces (by AFM imaging), and reveals fractal characteristics in the surface morphology (fractal analysis).",
  address="Elsevier",
  chapter="108712",
  doi="10.1016/j.apsusc.2014.05.086",
  institution="Elsevier",
  number="312",
  volume="312",
  year="2014",
  month="september",
  pages="81--86",
  publisher="Elsevier",
  type="journal article"
}