Detail publikace

TEMPERATURE AND FREQUENCY DEPENDENCE OF COMPLEX PERMITTIVITY FOR NIOBIUM OXIDE FILM AT COMMERCIAL ELECTROLYTIC CAPACITOR

ABUETWIRAT, I. CHVÁTAL, M.

Originální název

TEMPERATURE AND FREQUENCY DEPENDENCE OF COMPLEX PERMITTIVITY FOR NIOBIUM OXIDE FILM AT COMMERCIAL ELECTROLYTIC CAPACITOR

Typ

článek ve sborníku ve WoS nebo Scopus

Jazyk

angličtina

Originální abstrakt

The complex permittivity of thin oxide film at commercial niobium oxide capacitor was measured at different temperature range 218-373 K by using Janis cryostat system, with HP 4284A impedance analyzer with frequencies from 20 Hz to 1MHz. The real part of complex permittivity increases with temperature and decreases with frequency, the imaginary part of complex permittivity displays abroad maximum peak whose position shifts with temperature to a higher frequency region with an activation energy 0.055 eV. The measured imaginary parts of complex permittivity were studied by the graphical analysis of the obtained data as proposed by Havriliak -Negami (HN) equation.

Klíčová slova

Real part of complex permittivity, imaginary part of complex permittivity, niobium oxide capacitor, Havriliak-Negami equation.

Autoři

ABUETWIRAT, I.; CHVÁTAL, M.

Rok RIV

2012

Vydáno

29. 8. 2012

Nakladatel

FEKT VUT Brno

Místo

VSACKÝ CÁB

ISBN

978-80-214-4579-6

Kniha

Proceedings of the conference VSACKÝ CÁB 2012

Edice

1

Číslo edice

1

Strany od

4

Strany do

7

Strany počet

4

BibTex

@inproceedings{BUT100593,
  author="Inas Faisel {Abuetwirat} and Miloš {Chvátal}",
  title="TEMPERATURE AND FREQUENCY DEPENDENCE OF COMPLEX PERMITTIVITY FOR NIOBIUM OXIDE FILM AT COMMERCIAL ELECTROLYTIC CAPACITOR",
  booktitle="Proceedings of the conference VSACKÝ CÁB 2012",
  year="2012",
  series="1",
  number="1",
  pages="4--7",
  publisher="FEKT VUT Brno",
  address="VSACKÝ CÁB",
  isbn="978-80-214-4579-6"
}