Patterning large area plasmonic nanostructures on nonconductive substrates using variable pressure electron beam lithography

článek v časopise ve Web of Science, Jimp

angličtina

Variable pressure electron beam lithography (VP-EBL) is a unique technique offering alternative cost-effective approach for patterning on nonconductive substrates that are often required for many applications in the field of plasmonics. Here, the authors present the use of the VP-EBL for accurate fabrication of nanoantennas with plasmonic resonances in visible range in order to achieve artificial sample coloring. Using confocal transmission spectroscopy, the authors show that optimized VP-EBL process enables fabrication of plasmonic nanoantennas with optical properties equivalent to those produced via traditional approach. Furthermore, the authors demonstrate high stability of the exposure process by fabricating a millimeter-sized color image composed of plasmonic nanoantennas.

Plasmons, Nanopatterning, Nanostructures, Scanning electron microscopy, High pressure

BABOCKÝ, J.; DVOŘÁK, P.; LIGMAJER, F.; HRTOŇ, M.; ŠIKOLA, T.; BOK, J.; FIALA, J.

7. 11. 2016

1071-1023

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B

34

6

Spojené státy americké

06K801-1

06K801-4

4