Detail publikace

Spectroscopic monitoring of low pressure plasma deposition of Silane and Siloxane based thin films

RAŠKOVÁ, Z., ŠORMOVÁ, H., HAVELKOVÁ, I., KRČMA, F., VANĚK, J., PŘIKRYL, R., ČECH, V.

Originální název

Spectroscopic monitoring of low pressure plasma deposition of Silane and Siloxane based thin films

Anglický název

Spectroscopic monitoring of low pressure plasma deposition of Silane and Siloxane based thin films

Jazyk

en

Originální abstrakt

The main part of this work is focused on the identification of the spectra measured during the plasma deposition using the vinyltriethoxysilane in a continual regime and also in a pulsed regime with the varied relative pulse duration and during deposition with an amount of oxygen added in various ratios. The next part is focused on spectroscopic observation during the plasma deposition using the hexamethyldisiloxane and gamma-metacryloxyprophyltrimethoxysilane.

Anglický abstrakt

The main part of this work is focused on the identification of the spectra measured during the plasma deposition using the vinyltriethoxysilane in a continual regime and also in a pulsed regime with the varied relative pulse duration and during deposition with an amount of oxygen added in various ratios. The next part is focused on spectroscopic observation during the plasma deposition using the hexamethyldisiloxane and gamma-metacryloxyprophyltrimethoxysilane.

Dokumenty

BibTex


@inproceedings{BUT8852,
  author="Zuzana {Rašková} and Hana {Šormová} and Iveta {Havelková} and František {Krčma} and Jan {Vaněk} and Radek {Přikryl} and Vladimír {Čech}",
  title="Spectroscopic monitoring of low pressure plasma deposition of Silane and Siloxane based thin films",
  annote="The main part of this work is focused on the identification of the spectra measured during the plasma deposition using the vinyltriethoxysilane in a continual regime and also in a pulsed regime with the varied relative pulse duration and during deposition with an amount of oxygen added in various ratios.  The next part is focused on spectroscopic observation during the plasma deposition using the hexamethyldisiloxane and gamma-metacryloxyprophyltrimethoxysilane.",
  address="MATFYZPRESS",
  booktitle="Proceedings of the 12th Annual Conference of Doctoral Students - WDS 2003",
  chapter="8852",
  institution="MATFYZPRESS",
  year="2003",
  month="november",
  pages="441",
  publisher="MATFYZPRESS",
  type="conference paper"
}