Detail publikace

UV-VIS plošná reflektometrie

SPOUSTA, J. URBÁNEK, M. NEUGEBAUER, P. ŠIKOLA, T. NAVRÁTIL, K.

Originální název

UV-VIS Areal Reflectometry

Český název

UV-VIS plošná reflektometrie

Anglický název

UV-VIS Areal Reflectometry

Typ

prezentace

Jazyk

en

Originální abstrakt

Construction and the first experimental results of the new apparatus for areal imaging of the optical properties of nonabsorbing or weakly absorbing thin films will be presented. The system is based on the principles of the spectroscopic reflectometry[1]; observed sample is illuminated at various wavelengths (selected by a monochromator) in the UV-VIS region and the intensity of the reflected light is detected by a CCD camera. Optical parameters of the thin films 50 - 2000 nm thick can be consequently calculated from the reflectance spectra. Sample size and lateral resolution is customizable and depends on imaging optics. Unique construction allows both, ex situ and in situ measurements, the computer control provides fast measurements and data acqusition. The apparatus can be used for the feedback control of various thin film processing. In the contribution application examples will be presented.

Český abstrakt

Jsou prezentovány první výsledky a konstrukční provedení zařízení pro in-situ plošné zobrazování a sledování optických vlastností neabsorbujících bebo slabě absorbujících tenkých vrstev.

Anglický abstrakt

Construction and the first experimental results of the new apparatus for areal imaging of the optical properties of nonabsorbing or weakly absorbing thin films will be presented. The system is based on the principles of the spectroscopic reflectometry[1]; observed sample is illuminated at various wavelengths (selected by a monochromator) in the UV-VIS region and the intensity of the reflected light is detected by a CCD camera. Optical parameters of the thin films 50 - 2000 nm thick can be consequently calculated from the reflectance spectra. Sample size and lateral resolution is customizable and depends on imaging optics. Unique construction allows both, ex situ and in situ measurements, the computer control provides fast measurements and data acqusition. The apparatus can be used for the feedback control of various thin film processing. In the contribution application examples will be presented.

Vydáno

25.09.2005

Místo

Vienna

Strany od

111

Strany do

111

Strany počet

1

BibTex


@misc{BUT63402,
  author="Jiří {Spousta} and Michal {Urbánek} and Petr {Neugebauer} and Tomáš {Šikola} and Karel {Navrátil}",
  title="UV-VIS Areal Reflectometry",
  annote="Construction and the first experimental results of the new apparatus for areal imaging of the optical properties of nonabsorbing or weakly absorbing thin films will be presented. The system is based on the principles of the spectroscopic reflectometry[1]; observed sample is illuminated at various wavelengths (selected by a monochromator) in the UV-VIS region and the intensity of the reflected light is detected by a CCD camera. Optical parameters of the thin films 50 - 2000 nm thick can be consequently calculated from the reflectance spectra. Sample size and lateral resolution is customizable and depends on imaging optics. Unique construction allows both, ex situ and in situ measurements, the computer control provides fast measurements and data acqusition. The apparatus can be used for the feedback control of various thin film processing. In the contribution application examples will be presented.",
  chapter="63402",
  edition="1",
  year="2005",
  month="september",
  pages="111--111",
  type="presentation"
}